Layer-by-layer interference lithography of three-dimensional microstructures in SU-8

Advanced Engineering Materials

Volumn 11, Issue 5, 2009, Pages 408-411

  Lasagni, Andrés F ^a,b   Yuan, Dajun ^a   Das, Suman ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^b FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

3D STRUCTURE; BENZOTRIAZOLE; EXPOSURE PARAMETERS; HIGH-POWER; INTERFERENCE LITHOGRAPHY; LAYER-BY-LAYER; MICROMETER SCALE; PATTERNING APPROACHES; PHOTOPOLYMERIZABLE MATERIALS; PULSED ND:YAG LASER; RAPID FABRICATION; THREE-DIMENSIONAL MICROSTRUCTURES; UV ABSORBERS; UV-LIGHT;

ABSORPTION; FABRICATION; LITHOGRAPHY; NEODYMIUM LASERS; PHOTORESISTORS; PIGMENTS; PULSED LASER APPLICATIONS; SURFACE TREATMENT; THREE DIMENSIONAL;

PERIODIC STRUCTURES;

EID: 67049100251     PISSN: 14381656     EISSN: 15272648     Source Type: Journal    
DOI: 10.1002/adem.200800382     Document Type: Article

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