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Volumn 47, Issue 18, 2008, Pages 3221-3230

Three-beam-interference lithography: Contrast and crystallography

Author keywords

[No Author keywords available]

Indexed keywords

MOLECULAR PHYSICS; OPTICS;

GENERAL EXPRESSION; INTERFERENCE PATTERNS; LINEARLY POLARIZED; MONOCHROMATIC PLANE WAVES; THREE BEAMS;

POLARIZATION;

EID: 47549102528 PISSN: 1559128X EISSN: 15394522 Source Type: Journal
DOI: 10.1364/AO.47.003221 Document Type: Article

Times cited : (33)

References (9)

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- Dolling, G.¹ Wegener, M.² Soukoulis, C.M.³ Linden, S.⁴

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- J. L. Stay and T. K. Gaylord, Photo-mask for wafer-scale fabrication of two- and three-dimensional photonic crystal structures, in Frontiers in Optics, OSA Technical Digest (CD) (Optical Society of America, 2006), paper FThC5.
- J. L. Stay and T. K. Gaylord, "Photo-mask for wafer-scale fabrication of two- and three-dimensional photonic crystal structures," in Frontiers in Optics, OSA Technical Digest (CD) (Optical Society of America, 2006), paper FThC5.

5
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- Formation of a microfiber bundle by interference of three noncoplanar beams
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- Fabrication of photonic crystals for the visible spectrum by holographic lithography
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- Crystallography of two-dimensional photonic lattices formed by holography of three noncoplanar beams
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8
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- Formation of three-dimensional periodic microstructures by interference of four noncoplanar beams
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.