Photonic band-gap formation by optical-phase-mask lithography

Physical Review E - Statistical, Nonlinear, and Soft Matter Physics

Volumn 73, Issue 4, 2006, Pages

  Chan, Timothy Y M ^a   Toader, Ovidiu ^a   John, Sajeev ^a  

^a UNIVERSITY OF TORONTO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; DIFFRACTION GRATINGS; MASKS; PHOTOLITHOGRAPHY; POLYMERS; SILICON;

OPTICAL PHASE MASK (OPM); PHOTONIC BAND GAPS (PBG'S); SILICON REPLICATION METHODS;

PHOTONS;

EID: 33646384385     PISSN: 15393755     EISSN: 15502376     Source Type: Journal    
DOI: 10.1103/PhysRevE.73.046610     Document Type: Article

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