Fabrication of two-dimensional photonic crystals with controlled defects by use of multiple exposures and direct write

Applied Optics

Volumn 42, Issue 27, 2003, Pages 5450-5456

  Pang, Lin ^a   Nakagawa, Wataru ^a   Fainman, Yeshaiahu ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; PHOTONS; PHOTORESISTS; ULTRAVIOLET RADIATION; WAVEGUIDES;

PHOTONIC CRYSTALS;

CRYSTALS;

EID: 0142005545     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.42.005450     Document Type: Article

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