Reduction of reflection losses in ZnGeP2 using motheye antireflection surface relief structures

Applied Physics Letters

Volumn 80, Issue 13, 2002, Pages 2242-2244

  Aydin, C ^a   Zaslavsky, A ^b   Sonek, G J ^c   Goldstein, J ^d  

^a BROWN UNIVERSITY   (United States)

^b Brown University   (United States)

^c Optical Switch Corporation   (United States)

^d AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION; ANTIREFLECTION SURFACES; CUTOFF WAVELENGTHS; EFFECTIVE REFRACTIVE INDEX; ETCHING PROCESS; INTERFERENCE LITHOGRAPHY; MOTH-EYE STRUCTURE; MOTHEYE; NONLINEAR CRYSTALS; PATTERNING TECHNIQUES; REFLECTION LOSS; SUB-WAVELENGTH; SURFACE CONTAMINATIONS; SURFACE PATTERN; SURFACE REFLECTIONS; ZINC GERMANIUM PHOSPHIDE;

CRYSTAL STRUCTURE; CRYSTALS; GERMANIUM; REFRACTIVE INDEX;

REACTIVE ION ETCHING;

EID: 79955987809     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1466519     Document Type: Article

References (14)

1. Y. V. Rud, Semiconductors 28, 633 (1994). sem SMICES 1063-7826
2. K. L. Vodopyanov, J. Opt. Soc. Am. 10, 1723 (1993).
3. A. Miller, R. G. Humphreys, and B. Chapman, J. Phys. 36, C3 (1975).
4. R. D. Peterson, K. L. Schepler, and J. L. Brown, J. Opt. Soc. Am. B 12, 2142 (1995). job JOBPDE 0740-3224
5. S. Guha, M. Bartsch, F. K. Hopkins, M. P. Eaton, S. D. Setzler, P. G. Schunemann, and T. M. Pollak, Proc. SPIE 3793, 9 (1999). spi PSISDG 0277-786X
6. S. J. Wilson and M. C. Hutley, Opt. Acta 29, 993 (1982). opa OPACAT 0030-3909
7. A. B. Harker and J. F. DeNatale, Proc. SPIE 1760, 261 (1992). spi PSISDG 0277-786X
8. J. F. DeNatale, P. J. Hood, J. F. Flintoff, and A. B. Harker, J. Appl. Phys. 71, 1388 (1992). jap JAPIAU 0021-8979
9. William Southwell, J. Opt. Soc. Am. A 8, 549 (1991). joa JOAOD6 0740-3232
10. K. L. Vodopyanov, J. Opt. Soc. Am. B 16, 1579 (1999). job JOBPDE 0740-3224
11. H. I. Smith, Proc. IEEE 62, 1361 (1974). iee IEEPAD 0018-9219
12. S. H. Zaidi and S. R. J. Brueck, J. Vac. Sci. Technol. B 11, 658 (1993). jvb JVTBD9 0734-211X
13. S. D. Setzler, P. G. Schunemann, T. M. Pollak, M. C. Ohmer, J. T. Goldstein, F. K. Hopkins, K. T. Stevens, L. E. Haliburton, and N. C. Giles, J. Appl. Phys. 86, 6677 (1999). jap JAPIAU 0021-8979
14. H.-G. Ang, L.-L. Chng, Y.-W. Lee, C. J. Flynn, P. C. Smith, and A. W. Vere, in Infrared Applications of Semiconductors III, Materials Research Society Symposium Proceedings, edited by M. O. Manasreh, B. J. H. Stadler, I. Ferguson, and Y.-H. Zhang (Materials Research Society, Warrendale, PA, 2000), Vol. 607, pp. 433-439.