Interferometric lithography of sub-micrometer sparse hole arrays for field-emission display applications

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 5, 1996, Pages 3339-3349

  Chen, Xiaolan ^a,c   Zaidi, Saleem H ^a   Brueck, S R J ^a,c   Devine, Daniel J ^b,d  

^a UNIVERSITY OF NEW MEXICO   (United States)

^b Coloray Display Corporation ^*  (United States)

^c Dept of Elec and Comp Engineering ^*

^d Plasmaco Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000944804     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588533     Document Type: Article

References (12)

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