Fabrication of ellipticity-controlled microlens arrays by controlling the parameters of the multiple-exposure two-beam interference technique

Applied Optics

Volumn 50, Issue 4, 2011, Pages 579-585

  Do, Danh Bich ^a,b   Lai, Ngoc Diep ^c   Wu, Cheng Yi ^a,d   Lin, Hung Jian ^a   Hsu, Chen Chia ^a,e  

^a NATIONAL CHUNG CHENG UNIVERSITY   (Taiwan)

^b HANOI NATIONAL UNIVERSITY OF EDUCATION   (Viet Nam)

^c LABORATOIRE DE PHOTONIQUE QUANTIQUE ET MOLÉCULAIRE   (France)

^d INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^e NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; MICROLENSES; MICROOPTICS; OPTICAL INSTRUMENT LENSES; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY;

EMBOSSING TECHNIQUES; FABRICATED STRUCTURES; MICRO-LENS ARRAYS; MULTIPLE EXPOSURE; PLASTIC REPLICATION; ROTATION ANGLES; TWO-BEAM INTERFERENCE; TWO-DIMENSIONAL PERIODIC STRUCTURES;

FABRICATION;

EID: 79551566002     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.50.000579     Document Type: Article

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