Hybrid optical maskless lithography: Scaling beyond the 45 nm node

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2743-2748

  Fritze, M ^a   Bloomstein, T M ^a   Tyrrell, B ^a   Fedynyshyn, T H ^a   Efremow Jr , N N ^a   Hardy, D E ^a   Cann, S ^a   Lennon, D ^a   Spector, S ^a   Rothschild, M ^a   Brooker, P ^b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b Sigma CAD Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH-RESOLUTION DENSE GRATINGS; HYBRID OPTICAL MASKLESS LITHOGRAPHY; IMMERSION; PROJECTION LITHOGRAPHY;

COMPUTER SIMULATION; DIFFRACTION GRATINGS; MASKS; MICROELECTRONICS; OPTICAL RESOLVING POWER; THROUGHPUT;

PHOTOLITHOGRAPHY;

EID: 29044448868     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2062327     Document Type: Article

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