Design considerations for a cascaded grating interferometer suitable for extreme ultraviolet interference lithography

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 2, 2009, Pages

  Levine, Zachary H ^a   Grantham, Steven ^a   Lucatorto, Thomas B ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Extreme ultraviolet; Interferometry; Microlithography

Indexed keywords

CURVE FITTING; LITHOGRAPHY; SYNCHROTRONS;

ALGEBRAIC ANALYSIS; BAND PASS; BENDING MAGNETS; CASCADED GRATINGS; DEFOCUS; DESIGN CONSIDERATIONS; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLET INTERFERENCE LITHOGRAPHIES; EXTREME ULTRAVIOLET SOURCES; FEATURE SIZES; FRINGE CONTRASTS; GRATING PERIODS; HIGH DEMAND; INSERTION DEVICE; NANO-SCALE PATTERNS; SINGLE GRATING; SPATIAL AND TEMPORAL COHERENCE; SYNCHROTRON SOURCE; WAVE-FRONT CURVATURE;

INTERFEROMETERS;

EID: 80055059510     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3112008     Document Type: Article

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