Five beam holographic lithography for simultaneous fabrication of three dimensional photonic crystal templates and line defects using phase tunable diffractive optical element

Optics Express

Volumn 17, Issue 19, 2009, Pages 16625-16631

  Lin, Yuankun ^a   Harb, Ahmad ^a   Lozano, Karen ^a   Xu, Di ^b   Chen, K P ^b  

^a UNIVERSITY OF TEXAS PAN AMERICAN   (United States)

^b University of Pittsburgh   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL LATTICES; DEFECTS; DENSITY (OPTICAL); DIFFRACTION GRATINGS; DIFFRACTIVE OPTICAL ELEMENTS; ENERGY GAP; FABRICATION; GLASS; HOLOGRAPHY; LIGHT SENSITIVE MATERIALS; LITHOGRAPHY; OPTICAL LATTICES; PHOTONIC CRYSTALS; PHOTONICS; PHOTORESISTS;

EXPERIMENTAL DEMONSTRATIONS; HOLOGRAPHIC FABRICATION; HOLOGRAPHIC LITHOGRAPHY; PHOTONIC CRYSTAL TEMPLATES; PHOTOSENSITIVE POLYMERS; TETRAGONAL SYMMETRIES; THREE DIMENSIONAL PHOTONIC CRYSTALS; TWO-BEAM INTERFERENCE;

CRYSTAL DEFECTS;

EID: 70349204201     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.016625     Document Type: Article

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