Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography

Applied Physics Letters

Volumn 75, Issue 15, 1999, Pages 2328-2330

  Solak, H H ^a   He, D ^a   Li, W ^a   Singh Gasson, S ^a   Cerrina, F ^a   Sohn, B H ^b   Yang, X M ^b   Nealey, P ^b  

^a University of Wisconsin Madison   (United States)

^b UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001482512     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.125005     Document Type: Article

References (14)

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