Sub-50 nm patterning by immersion interference lithography using a Littrow prism as a Lloyd's interferometer

Optics Letters

Volumn 35, Issue 20, 2010, Pages 3450-3452

  De Boor, Johannes ^a   Kim, Dong Sik ^a   Schmidt, Volker ^a  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

IMMERSION INTERFERENCE LITHOGRAPHY; IMMERSION LITHOGRAPHY; LINE PATTERN; LITTROW; LLOYD'S MIRROR; METAL-COATED; STRUCTURE SIZES; SUB-50 NM;

MIRRORS; PHOTOLITHOGRAPHY; PRISMS; REFRACTIVE INDEX;

INTERFEROMETERS;

EID: 78549255918     PISSN: 01469592     EISSN: 15394794     Source Type: Journal    
DOI: 10.1364/OL.35.003450     Document Type: Article

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