Three-beam interference lithography methodology

Review of Scientific Instruments

Volumn 82, Issue 2, 2011, Pages

  Stay, J L ^a   Burrow, G M ^a   Gaylord, T K ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALIGNMENT PARAMETER; BEAM INTERFERENCE LITHOGRAPHY; METAMATERIAL DEVICES; OPTICAL ELEMENTS; PERIODIC LATTICES; PHOTONIC CRYSTAL DEVICES; ROD-LIKE STRUCTURES; SPECIFIC DESIGN; SUB-WAVELENGTH; SYSTEMATIC METHODOLOGY; TWO-DIMENSIONAL PERIODIC STRUCTURES; WAVE VECTOR;

LATTICE CONSTANTS; LITHOGRAPHY; METAMATERIALS; PHOTONIC CRYSTALS; PHOTONIC DEVICES; PHOTORESISTS;

PERIODIC STRUCTURES;

EID: 79952135475     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3535557     Document Type: Article

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