Interferometric lithography for nanoscale feature patterning: A comparative analysis between laser interference, evanescent wave interference, and surface plasmon interference

Applied Optics

Volumn 49, Issue 35, 2010, Pages 6710-6717

  Sreekanth, Kandammathe Valiyaveedu ^a   Chua, Jeun Kee ^a   Murukeshan, Vadakke Matham ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE REFLECTION; PHOTORESISTS; WAVE INTERFERENCE;

COMPARATIVE ANALYSIS; CONVENTIONAL LASERS; EVANESCENT WAVE INTERFERENCE; FOUR-BEAM INTERFERENCE; INTERFEROMETRIC LITHOGRAPHY; LASER INTERFERENCE; MULTIPLE BEAM INTERFERENCE; NANOSCALE FEATURES;

PLASMONS;

EID: 78650478275     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.49.006710     Document Type: Article

References (28)

1. I. B. Divliansky, A. Shishido, I. C. Khoo, T. S. Mayer, D. Pena, S. Nishimura, C. D. Keating, and T. E. Mallouk, "Fabrication of two-dimensional photonic crystals using interference lithography and electrodeposition of CdSe," Appl. Phys. Lett. 79, 3392-3394 (2001). (Pubitemid 33600839)
2. H. Li, C. Du, X. Chen, and Y. Fu, "Ag dots array fabricated using laser interference technique for biosensing," Sens. Actuators B 134, 940-944 (2008).
3. M. Farhoud, J. Ferrera, A. J. Lochtenburg, T. E. Murphy, M. L. Scahattenburg, J. Carter, C. A. Ross, and H. I. Smith, "Fabrication of 200 nm period nanomagnet arrays using interference lithography and a negative resist," J. Vac. Sci. Technol. B 17, 3182-3185 (1999).
4. J. P. Spallas, A. M. Harwryluk, and D. R. Kania, "Field emitter array mask patterning using laser interference lithography," J. Vac. Sci. Technol. B 13, 1973-1978 (1995).
5. N. Feth, C. Enkrich, M. Wegener, S. Linden, "Large-area magnetic metamaterials via compact interference lithography," Opt. Express 15, 501-507 (2007).
6. R. Ji,W. Lee, R. Scholz, U. Gosele, and K. Nielsch, "Templated fabrication of nanowire and nanoring arrays based on interference lithography and electrochemical deposition," Adv. Mater. 18, 2593-2596 (2006).
7. Q. Wie, M. H. Hong, H. L. Tan, G. X. Chen, L. P. Shi, and T. C. Chong, "Fabrication of nanostructures with laser interference lithography," J. Alloys Compd. 449, 261-264 (2008).
8. N. Kramer, M. Niesten, and C. Schonenberger, "Resistless high resolution optical lithography on silicon," Appl. Phys. Lett. 67, 2989-2991 (1995).
9. A. F. Lasagni, D. F. Acevedo, C. A. Barbero, and F. Mucklich, "One-step production of organized surface architectures on polymeric materials by direct laser interference patterning," Adv. Eng. Mater. 9, 99-103 (2007).
10. W. Lee, R. Ji, C. Ross, U. Gosele, and K. Nielsch, "Wafer-scale Ni imprint stamps for porous alumina membranes based on interference lithography," Small 2, 978-982 (2006).
11. J. de Boor, N. Geyer, U. Gosele, and V. Schmidt, "Three-beam interference lithography: upgrading a Lloyd's interferometer for single-exposure hexagonal patterning," Opt. Lett. 34, 1783-1785 (2009).
12. C. Lu, X. K. Hu, S. S. Dimov, and R. H. Lipson, "Controlling large-scale film morphology by phase manipulation in interference lithography," Appl. Opt. 46, 7202-7206 (2007).
13. J. K. Chua and V. M. Murukeshan, "Patterning of twodimensional nanoscale features using grating-based multiple beams interference lithography," Phys. Scr. 80, 015401 (2009).
14. S. Sainov, E. Anne, E. Carole, and D. J. Lougnot, "High spatial frequency evanescent wave holographic recording in photopolymers," J. Opt. A: Pure Appl. Opt. 5, 142-146 (2003).
15. P. S. Ramanujam, "Evanescent polarization holographic recording of sub-200 nm gratings in an azobenzene polyester," Opt. Lett. 28, 2375-2377 (2003).
16. L. P. Ghislain, V. B. Elings, K. B. Crozier, S. R. Manalis, S. C. Minne, K. Wilder, G. S. Kino, and C. F. Quate, "Near-field photolithography with a solid immersion lens," Appl. Phys. Lett. 74, 501-503 (1999).
17. R. J. Blaikie and S. J. McNab, "Evanescent interferometric lithography," Appl. Opt. 40, 1692-1698 (2001).
18. J. C. Martinez-Anton, "Surface relief subwavelength gratings by means of total internal reflection evanescent wave interference lithography," J. Opt. A: Pure Appl. Opt. 8, S213-S218 (2006).
19. J. K. Chua and V. M. Murukeshan, "UV laser-assisted multiple evanescent waves lithography for near-field nanopatterning," Micro Nano Lett. 4, 210-214 (2009).
20. K. V. Sreekanth and V. M. Murukeshan, "Large-area maskless surface plasmon interference for one-and two-dimensional periodic nanoscale feature patterning," J. Opt. Soc. Am. A 27, 95-99 (2010).
21. K. V. Sreekanth and V. M. Murukeshan, "Four beams surface plasmon interference nanoscale lithography for patterning of two-dimensional periodic features," J. Vac. Sci. Technol. B 28, 128-130 (2010).
22. X. Luo and T. Ishihara, "Surface plasmon resonant interference nanolithography technique," Appl. Phys. Lett. 84, 4780-4782 (2004).
23. W. Srituravanich, N. Fang, C. Sun, Q. Luo, and X. Zhang, "Plasmonic nanolithography," Nano Lett. 4, 1085-1088 (2004).
24. Z. W. Liu, Q. H. Wei, and X. Zhang, "Surface plasmon interference nanolithography," Nano Lett. 5, 957-961 (2005).
25. K. V. Sreekanth, V. M. Murukeshan, and J. K. Chua, "A planar layer configuration for surface plasmon interference nanoscale lithography," Appl. Phys. Lett. 93, 093103 (2008).
26. D. B. Shao and S. C. Chen, "Surface-plasmon-assisted nanoscale photolithography by polarized light," Appl. Phys. Lett. 86, 253107 (2005).
27. H. Raether, Surface Plasmons on Smooth and Rough Surfaces and on Gratings (Springer-Verlag, 1988).
28. A. Passian, A. Wig, L. Lereu, P. G. Evans, F. Meriaudeau, T. Thundat, and T. L. Ferrell, "Probing large area SP interference in thin metal films using photon scanning tunneling microscopy," Ultramicroscopy 100, 429-436 (2004).