Novel cold cathode materials and applications

Materials Science and Engineering R: Reports

Volumn 48, Issue 2-5, 2005, Pages 47-189

  Xu, N S ^a   Huq, S Ejaz ^b  

^a SUN YAT SEN UNIVERSITY   (China)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

Carbon nanotube; Cold cathode; Composite emitter; Diamond film; Field emission; Field emission display; Field emitter array; One dimensional nanomaterial

Indexed keywords

CARBON NANOTUBES; DIAMOND FILMS; ELECTRIC FIELD EFFECTS; FIELD EMISSION CATHODES; FIELD EMISSION DISPLAYS; MICROELECTRONICS; MICROWAVE DEVICES; MILITARY APPLICATIONS; SOLID STATE DEVICES; SPACE APPLICATIONS; THERMIONIC EMISSION; VACUUM;

COLD CATHODE; COMPOSITE EMITTERS; FIELD EMISSION (FE); FIELD-EMITTER ARRAYS; ONE-DIMENSIONAL NANOMATERIALS; QUANTUM TUNNELING;

COLD CATHODE TUBES;

EID: 14144249683     PISSN: 0927796X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mser.2004.12.001     Document Type: Review

References (414)

1. J.L. Grand-Clement Proceedings of the 6th IVMC Newport, RI 1993 3
2. A. Ghis, R. Meyer, P. Ramband, F. Levy, and T. Leroux IEEE Trans. Electron Devices 38 1991 2320
3. W.B. Choi, D.S. Chung, J.H. Kang, H.Y. Kim, Y.W. Jin, I.T. Han, Y.H. Lee, J.E. Jung, N.S. Lee, G.S. Park, and J.M. Kim Appl. Phys. Lett. 75 1999 3129
4. K.R. Shoulders Adv. Comp. 2 1961 135
5. C.A. Spindt J. Appl. Phys. 39 1968 3504
6. W.P. Kang, A. Wisitsora-at, J.L. Davidson, M. Howell, D.V. Kevus, Q. Li, and F. Xu J. Vac. Sci. Technol. B17 1999 740
7. J. Robertson Adv. Phys. 35 1986 317
8. J.C. She, N.S. Xu, S.E. Huq, S.Z. Deng, and J. Chen Appl. Phys. Lett. 81 2002 4257
9. S. Iijima Nature 354 1991 56
10. N.S. Xu, S.Z. Deng, and J. Chen Ultramicroscopy 95 2003 19
11. W.Z. Li, S.S. Xie, L.X. Qian, B.H. Chang, B.S. Zou, W.Y. Zhou, R.A. Zhao, and G. Wang Science 274 1996 1701
12. S.S. Fan, M.G. Chapline, N.R. Franklin, T.W. Tombler, A.M. Cassell, and H. Dai Science 283 1999 512
13. Z.S. Wu, S.Z. Deng, J. Zhou, N.S. Xu, J. Chen, and J. Chen Appl. Phys. Lett. 80 2002 3829
14. J. Chen, S.Z. Deng, and N.S. Xu Appl. Phys. Lett. 80 2002 3620
15. J. Zhou, N.S. Xu, S.Z. Deng, J. Chen, J.C. She, and Z.L. Zhong Adv. Mater. 15 2003 1539
16. S.Z. Deng, Z.S. Wu, N.S. Xu, and J. Chen Ultramicroscopy 89 2001 105
17. Q.H. Wang, T.D. Corrigan, J.Y. Dai, and R.P.H. Chang Appl. Phys. Lett. 72 1998 2912
18. Q.H. Wang, M. Yan, and R.P.H. Chang Appl. Phys. Lett. 78 2001 1294
19. P. Leqagneux, G. Pirio, E. Balossier, J.P. Schnell, D. Pribat, K.B.K. Teo, M. Chhowalla, D.G. Hasko, G.A.J. Amaratunga, W.I. Milne, V. Semet, V.T. Binh, W.H. Bruenger, H. Hanssen, and D. Friedrich Phantoms Newslett. 5 2002 8
20. R.H. Fowler, and L. Nordheim Proc. Roy. Soc. Lond. A119 1928 173
21. E.R. Holland, M.T. Harrison, M. Huang, and P.R. Wilshaw J. Vac. Sci. Technol. B17 1999 580
22. P. Rai-Chowdhury Handbook of Microlithography, Micromachining and Microfabrication Microlithography, vol. 1 1977 SPIE Bellingham, WA
23. S.P. Beaumont, P.G. Bower, T. Tamamura, and C.D.W. Wilkinson Appl. Phys. Lett. 38 1981 436
24. H.G. Craighead, R.E. Holland, L.D. Jackel, and P.M. Mankiewich Appl. Phys. Lett. 42 1983 38
25. Y. Ochiai, S. Manako, S. Samukawa, K. Takeuchi, and T. Yamamoto Microelectron. Eng. 30 1996 415
26. M.D. Levenson, N.S. Viswanathan, and R.A. Simpson IEEE Trans. Electron Devices ED-29 1982 1828
27. M.D. Levenson Phys. Today July 1993 28
28. S.J. Holmes, P.H. Mitchell, and M.C. Hakey IBM J. Res. Dev. 41 1997 7
29. C.Y. Chang, and S.M. Sze USLI Technology 1996 McGraw Hill p. 275
30. C.O. Bozler, C.T. Harris, S. Rabe, D.D. Rathman, and M.A. Hollis J. Vac. Sci. Technol. B2 1994 629
31. C.A. Spindt, C.E. Holland, A. Rossengreen, and I. Brodie IEEE Trans. Electron Devices ED-38 1991 2355
32. J.H. Choi, J.W. Kim, J.P. Hong, J.M. Kim, D. Lim, and A.R. Zoulkarneev SID International Symposium, Digest of Technical Papers XXVIII 1997 595
33. F. Clube Diffractive Optics for Industrial and Commercial Applications J. Turunen F. Wyrowski Holographic Microlithography 1997 Akademie Verlag 391 418
34. A.R. Nobari, F. Clube, M. Jorda, S. Mourgue, S. Inoue, C. Iriguchi, E. Grass, and H. Mayer Proceedings of AM-LCD'03 Conference 2003 9 12
35. F. Clube SID International Symposium, Digest of Technical Papers XXXIV 2003 13
36. G.J. Dolan Appl. Phys. Lett. 31 1977 337
37. H.S. Uh, and J.D. Lee J. Vac. Sci. Technol. B13 1995 456
38. S.E. Huq, L. Wang, CMF of Rutherford Appleton Laboratory, UK, internal communication.
39. B.E. Deal, and A.S. Grove J. Appl. Phys. 1965 3770
40. S. Wolf, and R.N. Tauber Silicon Processing for the VLSI Era Process Technology, vol. 1 1986 Lattice Press Sunsetbeach, CA 540-560
41. http://cmos.mirc.gatech.edu/documents/plasmadepositionII.pdf
42. C.A. Spindt, I. Brodie, L. Humphrey, and E.R. Westerberg J. Appl. Phys. 47 1976 203
43. C.A. Spindt, K.R. Shoulders, L.N. Heynick, US Patents 3,755,704 (1973)
44. C.A. Spindt, K.R. Shoulders, L.N. Heynick, US Patents 3,789,471 (1973)
45. C.A. Spindt, K.R. Shoulders, L.N. Heynick, US Patents 3,812,559 (1974).
46. Choi, H.S. Jeong, D.G. Pflug, A.I. Akinwande, and H.I. Smith Appl. Phys. Lett. 74 1999 3050
47. W.P. Dyke, and W.W. Dolan Adv. Electron. Electron. Phys. 8 1956 180
48. C.A. Spindt, P.R. Schwoebel, and C.E. Holland J. Inform. Display 2 2001 44
49. F.M. Charbonnaire, R.W. Strayer, L.W. Swanson, and E.E. Martin Phys. Rev. Lett. 13 1964 397
50. D. Seo, C.O. Kim, J.P. Hong, J.S. Shin, B.K. Song, S.N. Cha, J.W. Chung, J.M. Kim, and H.S. Baik Appl. Phys. Lett. 82 2003 3299
51. J.D. Lee, C.W. Oh, and B.G. Park J. Vac. Sci. Technol. B21 2003 440
52. M. Borel, US Patent 4,940,916 (1990).
53. J.D. Levine, R. Meyer, R. Baptist, T.E. Felter, and A.A. Talin Technical Digest of IVMC'94233 July 4-7, Grenoble, France 1994
54. J.D. Lee, C.W. Oh, H. Kim, J.W. Park, and B.G. Park J. Inform. Display 2 2001 66
55. S. Albin, W. Fu, A. Varghese, and A.C. Lavarias J. Vac. Sci. Technol. A17 1999 2104
56. S.E. Huq, L. Chen, and P.D. Prewett Microelectron. Eng. 27 1995 95
57. R.B. Marcus, T.S. Ravi, T. Gmitter, K. Chin, D. Liu, W.J. Orvis, D.R. Ciario, C.E. Hunt, and J. Trujilo Appl. Phys. Lett. 56 1990 238
58. S.E. Huq, G.H. Grayer, S.W. Moon, and P.D. Prewett Mater. Sci. Eng. B51 1998 150
59. L. Wang, S.E. Huq, CMF of Rutherford Appleton Laboratory, UK, internal communication, 2001.
60. L. Wang, S.E. Huq, CMF of Rutherford Appleton Laboratory, UK, internal communication, 2003.
61. S.E. Huq, unpublished.
62. T. Matsukawa, S. Kanemura, K. Tokunaga, and J. Itoh J. Vac. Sci. Technol. B18 2000 1111
63. S.E. Huq, M. Huang, P.D. Prewett, and P.R. Wilshaw J. Vac. Sci. Technol. B16 1998 796
64. E.C. Boswell, S.E. Huq, M. Huang, P.D. Prewett, and P.R. Wilshaw J. Vac. Sci Technol. B9 1996 1910
65. S.E. Huq, G.H. Grayer, and P.D. Prewett J. Vac. Sci. Technol. B15 1997 2855
66. W.A. Mackie, J.L. Morrissey, C.H. Hinrichs, and P.R. Davis J. Vac. Sci. Technol. A10 1992 2852
67. M.R. Rakhshandehroo, and S.W. Pang IEEE Trans. Electron Devices 4 1999 792
68. H.S. Uh, B.G. Park, and J.D. Lee J. Vac. Sci. Technol. B16 1998 866
69. J.L. Lee, S.P. Oh, S.Y. Han, S.Y. Kang, J.H. Lee, and K.I. Cho J. Appl. Phys. 87 2000 7349
70. S.E. Huq, J.C. She, RAL, UK and Sun Yat-Sen University, China, internal communication, 2002.
71. S.E. Huq, and N.S. Xu Microelectron. J. 34 2003 401
72. J.C. She, S.E. Huq, J. Chen, S.Z. Deng, and N.S. Xu J. Vac. Sci. Technol. B17 1999 592
73. S.E. Huq, P.D. Prewett, J.C. She, S.Z. Deng, and N.S. Xu Mater. Sci. Eng. B56 1999 189
74. O. Yavas, T. Hashimoto, N. Suzuki, M. Takai, Y. Higichi, M. Kobayashi, A. Hosono, and S. Okuda Jpn. J. Appl. Phys. 38 1991 7208
75. W.B. Choi, J.J. Cuomo, V.V. Zhirnov, A.F. Myers, and J.J. Hern Appl. Phys. Lett. 68 1996 720
76. H.A. Pohl Dielectrophoresis 1978 Cambridge University Press Boston, MA
77. K. Yokoo, M. Arai, M. Mori, J. Bae, and S. Ono J. Vac. Sci. Technol. B13 1995 491
78. R.T. Poole, D.R. Williams, J.D. Riley, J.G. Jenkinn, J. Liesegang, and R.C.G. Leckey Chem. Phys. Lett. 36 1975 401
79. M.J. Powers, M.C. Benjamin, L.M. Porter, R.J. Nemanich, R.F. Davis, J.J. Cuomo, G.L. Doll, and S.J. Harris Appl. Phys. Lett. 67 1995 3912
80. M.C. Benjamin, C. Wang, R.F. Davis, and R.J. Nemanich Appl. Phys. Lett. 64 1994 3288
81. V.V. Zhirnov, G.J. Wojak, W.B. Choi, J.J. Cuomo, and J.J. Hern J. Vac. Sci. Technol. A15 1997 1733
82. V. Milanovic, L. Doherty, D.A. Teasdale, C. Zhang, V. Nguyen, M. Last, and K.S.J. Pister IEEE Electron Device Lett. 21 2003 271
83. A.A. Ayon, C.C. Lin, R.A. Braff, M.A. Schmidt, R. Bayt, and H.H. Swain Solid State Sensor and Actuator Workshop Hilton Head, SC 1998 41 44
84. S. Park, D. Park, S. Hahm, J.H. Lee, H. Choi, and J.H. Lee IEEE Trans. Electron Devices 46 1999 1283
85. T. Debski, B. Volland, W. Barth, F. Shi, P. Hudek, I.W. Rangelow, P. Grabiec, K. Studzinska, M. Zaborowski, and S. Mitura J. Vac. Sci. Technol. B18 2000 896
86. P.R. Schwoebel, and C.A. Spindt Appl. Phys. Lett. 63 1993 33
87. Y. Wei, B. Chalamala, B.G. Smith, and C.W. Penn J. Vac. Sci. Technol. B 17 1999 233
88. R. Smith J. Phys. D 17 1984 1045
89. F.J.V. Himpsel, J.A.V. Knapp, J.A. Van Vechten, and D.E. Eastman Phys. Rev. B 20 1979 624
90. C. Wang, A. Garcia, D.C. Ingram, M. Lake, and M.E. Kordesch Electron. Lett. 27 1991 1459
91. M.W. Geis, A. Gregory, and B.B. Pate IEEE Trans. Electron. Dev. 38 1991 619
92. N.S. Xu, and R.V. Latham J. Phys. D 26 1993 1776
93. J. Liu, V.V. Zhirnov, A.F. Myers, W.B. Choi, G.J. Wojak, and J.J. Hren Proceedings of 1994 Tri-Service/NASA Cathode Workshop Cleveland, OH, USA, March 1994 99
94. J.B. Cui, J. Ristein, and L. Ley Phys. Rev. Lett. 81 1998 429
95. F. Maier, M. Riedel, B. Mantel, J. Ristein, and L. Ley Phys. Rev. Lett. 85 2000 3472
96. C. Bandis, and B.B. Pate Phys. Rev. B 52 1995 12056
97. L. Diederich, O.M. Küttel, E. Schaller, and L. Schlapbach Surf. Sci. 349 1996 176
98. Z. Zhang, M. Wensell, and J. Bernholc Phys. Rev. B 51 1995 5291
99. M.W. Geis, J.C. Twichell, J. Macaulay, and K. Okano Appl. Phys. Lett. 67 1995 1328
100. W.E. Pickett Phys. Rev. Lett. 73 1994 1664
101. P. Peinke, P. Kania, and P. Oelhafers Thin Solid Films 270 1995 124
102. J.E. Butler, and R.L. Wood A. Lettington J.W. Steeds Thin Film Diamond 1994 Chapman & Hall for the Royal Society London 15 (Chapter 2)
103. P.K. Bachmann A. Lettington J.W. Steeds Thin Film Diamond 1994 Chapman & Hall for the Royal Society London 31 (Chapter 3)
104. J. Robertson A. Lettington J.W. Steeds Thin Film Diamond 1994 Chapman & Hall for the Royal Society London 105 (Chapter 5)
105. O. Groning, O.M. Kuhel, E. Schaller, P. Groning, and L. Schlapbach Appl. Phys. Lett. 69 1996 476
106. J. Chen, S.Z. Deng, N.S. Xu, K.H. Wu, and E.G. Wang Technical Digest of the 11th IVMC USA 1998 174
107. N.S. Xu, A.D. Archer, and R.V. Latham Surf. Sci. 339 1995 194
108. K. Okano, S. Koizum, S.R.P. Silva, and G.A.J. Amaratunga Nature 381 1996 140
109. P. Lerner, N.W. Miskovsky, and P.H. Culter J. Vac. Sci. Technol. B16 1998 900
110. K.H. Bayliss, and R.V. Latham Proc. Roy. Soc. A 403 1986 285
111. R.V. Latham, K.H. Bayliss, and B.M. Cox J. Phys. D 19 1986 214
112. N.S. Xu, R.V. Latham, and Y. Tzeng Electron. Lett. 29 1993 1596
113. N.S. Xu, Y. Tzeng, and R.V. Latham J. Phys. D 27 1994 1988
114. W.B. Choi, R. Schlesser, G. Wojak, J.J. Cuomo, Z. Sitar, and J.J. Hren Technical Digest of 10th IVMC Kyongju, Korea 1997 494
115. C.-F. Shih, K.-S. Liu, and I.-N. Lin Diamond Relat. Mater. 9 2000 1591
116. T. Sugino, K. Kurigama, C. Kimura, and S. Kawasaki Appl. Phys. Lett. 73 1998 268
117. C. Kimura, S. Koizumi, M. Kamo, and T. Sugino Diamond Relat. Mater. 8 1999 759
118. W.N. Wang, N.A. Fox, J.W. Steeds, S.R. Lin, and J.E. Butler J. Appl. Phys. 80 1996 6809
119. M. Nago, J. Kondo, Y. Gotoh, H. Tsuji, J. Ishikawa, K. Miyata, and K. Kobashi Appl. Phys. Lett. 71 1997 2806
120. Y.H. Chen, C.T. Hu, and I.-N. Lin Appl. Surf. Sci. 142 1999 516
121. T. Yamada, A. Sawabe, S. Koizumi, J. Itoh, and K. Okano Appl. Phys. Lett. 76 2000 1297
122. N.F. Mott, and E.A. Davis Electronic Processes in Non-Crystalline Materials 1997 Clarendon Press Oxford
123. N.S. Xu, and R.V. Latham J. Phys. C2 1986 73
124. W. Zhu, G.P. Kochanski, S. Jin, and L. Seibles J. Appl. Phys. 78 1995 2707
125. W. Zhu, G.P. Kochanski, S. Jin, L. Seibles, D.C. Jacobson, M. McCormack, and A.E. White Appl. Phys. Lett. 67 1995 1157
126. M. Karpus, and R.N. Porter Atoms and Molecules 1970 W.A. Benjamin New York p. 263
127. M.W. Geis, J.C. Twichll, and T.M. Lyszczarz J. Vac. Sci. Technol. B14 1996 2060
128. N.S. Xu, and R.V. Latham J. Phys. D 19 1986 477
129. P.H. Culter, Z.H. Huang, N.M. Miskovsky, P. D'Ambrosio, and M. Chung J. Vac. Sci. Technol. B14 1996 2020
130. N.S. Xu, J. Chen, S.Z. Deng, K.H. Wu, and E.G. Wang J. Phys. D: Appl. Phys. 33 2000 1572
131. K.H. Park, S. Lee, and K.H. Koh Diamond Relat. Mater. 9 2000 1342
132. M.Q. Ding, D.M. Gruen, A.R. Krauss, O. Auciello, T.D. Corrgan, and R.P.H. Chang J. Vac. Sci. Technol. B17 1999 705
133. W. Zhu, G.P. Kochanski, and S. Jin Science 282 1998 1471
134. J. Chen, S.Z. Deng, J. Chen, J.C. She, and N.S. Xu J. Appl. Phys. 94 2003 5429
135. T. Sharda, T. Soga, T. Jimbo, and M. Umeno Diamond Relat. Mater. 9 2000 1331
136. V. Paillard, P. Melinon, V. Dapuis, J.P. Perez, and A. Perez Phys. Rev. Lett. 71 1993 4170
137. V. Paillard, P. Melinon, and V. Dapuis Phys. Rev. B49 1994 11433
138. A.C. Ferrari, and J. Bobertson Phys. Rev. B 63 2001 121405(R)
139. W. Zhu, G.P. Kochanski, and S. Jin Science 282 1998 1471
140. J. Chen, S.Z. Deng, J. Chen, Z.X. Yu, and N.S. Xu Appl. Phys. Lett. 74 1999 3651
141. J. Chen, S.Z. Deng, J. Chen, N.S. Xu, and S.E. Huq Appl. Phys. Lett. 80 2002 4030
142. M.W. Geis, N.N. Efremow, K.E. Krohm, J.C. Twichell, T.M. Lyszczarz, R. Kalish, J.A. Greer, and M.D. Tabat Nature 393 1998 431
143. S. Lee, S.Y. Han, and S.G. Oh Thin Solid Films 353 1999 45
144. D.S. Knight, and W.B. White J. Mater. Res. 4 1989 385
145. R.J. Nemanich, J.T. Glass, G. Lucovsky, and R.E. Shrode J. Vac. Sci. Technol. A6 1988 1789
146. A.A. Talin, L.S. Pan, K.F. McCarty, T.E. Felter, H.J. Doerr, and R.F. Bunshah Appl. Phys. Lett. 69 1996 3842
147. D.R. Mckenzie, D.C. Green, P.D. Swift, D.J.H. Cockayne, P.J. Martin, R.P. Netterfield, and W.G. Sainty Thin Solid Films 193 1990 418
148. D.R. Mckenzie, D. Muller, and B.A. Pailthorpe Phys. Rev. Lett. 67 1991 773
149. I.I. Aksenov, S.I. Valkula, V.G. Padalka, R.E. Strelnitski, and V.M. Khoroshikn Zh. Tekh. Fiz. 50 1980 2000
150. I.I. Aksenov, S.I. Valkula, V.G. Padalka, R.E. Strelnitski, and V.M. Khoroshikn Sov. Phys. Tech. Phys. 25 1980 1164
151. J. Robertson Mater. Sci. Eng. R 37 2002 129
152. B.S. Satyanarayana, A. Hart, W.I. Milne, and J. Robertson Appl. Phys. Lett. 71 1997 1430
153. A. Ilie, A. Hart, A.J. Flewitt, J. Robertson, and W.I. Milne J. Appl. Phys. 88 2000 6002
154. C. Arena, B. Kleinsorge, J. Robertson, W.I. Milne, and M.W. Welland J. Appl. Phys. 85 1999 1609
155. N.L. Rupesinghe, and G.A.J. Amaratunga Diamond Relat. Mater. 9 2000 1148 unpublished work
156. N.S. Xu R.V. Latham High Voltage Vacuum Insulation: Basic Concepts and Technological Practice 1995 Academic Press London (Chapter 4)
157. N. Missert, T.A. Friedmann, J.P. Sullivan, and R.G. Copeland Appl. Phys. Lett. 70 1997 1995
158. T.W. Mercer, N.J. DiNardo, J.B. Rothman, M.P. Siegal, T.A. Friedman, and L.J. Martinez-Miranda Appl. Phys. Lett. 72 1998 2244
159. N.S. Xu, J. Chen, J.C. She, S.Z. Deng, and J. Chen J. Phys. D 33 2000 2568
160. S. Prawer, K.W. Nugert, Y. Lifshitz, G.D. Lempert, E. Grossman, J. Kult, I. Avigal, and R. Kalish Diamond Relat. Mater. 5 1996 433
161. A. Hart, B.S. Satyanarayana, W.I. Milne, and J. Robertson Appl. Phys. Lett. 74 1999 1594
162. L.K. Cheah, X. Shi, E. Lin, and B.K. Tay J. Appl. Phys. 85 1999 6816
163. G.A.J. Amaratunga, V.S. Veerasamy, C.A. Davis, W.I. Milne, D.R. Mckenzie, J. Yuan, and M. Weiler J. Non-Crystalline Solid 164-166 1993 1119
164. G.A.J. Amaratunga, and S.R.P. Silva Appl. Phys. Lett. 68 1996 2529
165. J. Chen, A.X. Wei, S.Z. Deng, Y. Lu, X.G. Zheng, D.H. Chen, D. Mo, S.Q. Peng, and N.S. Xu J. Vac. Sci. Technol. B16 1998 697
166. L. Gangloff, E. Minoux, K.B.K. Teo, P. Vincent, V.T. Semet, V.T. Binh, M.H. Yang, I.Y.Y. Bu, R.G. Lacerda, G. Pirio, J.P. Schnell, D. Pribat, D.G. Hasko, G.A.J. Amaratunga, W.I. Milne, and P. Legagneux Nano Lett. 2 2004 1575
167. H.Z. Ma, L. Zhang, N. Yao, Y.J. Li, B.L. Zhang, and L.H. Hu Chin. Phys. Lett. 16 1999 608
168. B. Kleinsorge, A.C. Ferrari, J. Robertson, and W.I. Milne J. Appl. Phys. 88 2000 1149
169. J. Robertson, and C.A. Davis Diamond Relat. Mater. 4 1995 441
170. H.F. Cheng, F.Y. Chuang, C.H. Tsai, W.C. Wang, C.M. Huang, and I.-N. Lin Appl. Surf. Sci. 142 1999 504
171. N.S. Xu Ultramicroscopy 79 1999 59
172. N.S. Xu, J. Chen, and S.Z. Deng Appl. Phys. Lett. 76 2000 2463
173. P. Lerner, N.M. Miskovsky, and P.H. Culter J. Vac. Sci. Technol. B16 1998 900
174. R.D. Forrest, A.P. Burden, S.R.P. Silva, L.K. Cheah, and X. Shi Appl. Phys. Lett. 73 1998 3784
175. J. Chen, N.S. Xu, S.Z. Deng, J.C. She, and J. Chen J. Vac. Sci. Technol. B21 2003 581
176. D.S. Mao, X. Wang, W. Li, X.H. Liu, Q. Li, J.F. Xu, and K. Okano J. Vac. Sci. Technol. B18 2000 2420
177. N.L. Rupesinghe, M. Chhowalla, G.A.J. Amaratunga, P. Weightman, D. Martin, P. Unsworth, and J. Murray Appl. Phys. Lett. 77 2000 1908
178. R.E. Hurley, and P.J. Dooley J. Phys. D: Appl. Phys. 10 1977 195
179. N.S. Xu, J.C. She, S.E. Huq, S.Z. Deng, and J. Chen J. Vac. Sci. Technol. B19 2001 1059
180. N.S. Xu, J.C. She, J. Chen, S.Z. Deng, and J. Chen Appl. Phys. Lett. 77 2000 2921
181. J. Chen, S.Z. Deng, J. Chen, and N.S. Xu Appl. Phys. Lett. 80 2002 4030
182. T.Y. Ko, B. Chung, J.Y. Lee, D. Jeon, and K.R. Lee Technical Digest of the 10th IVMC Kyongju, Korea 1997 166
183. V.I. Merkulov, D.H. Lowndes, L.R. Baylor, A.A. Puretaky, G.E. Jellison, D.B. Geohegan, M.J. Paulus, C.E. Thomas, M.L. Simpson, J.A. Moore, and E. Voelkl Technical Digest of The 11th IVMC USA 1998 178
184. W.P. Kang, J.L. Davidson, A. Wisitsora-at, D.V. Kerns, and S.E. Kerns Technical Digest of 13th IVMC Guangzhou, China 1999 86
185. A. Wisitsora-at, W.P. Kang, J.L. Davidson, and D.V. Kerns Appl. Phys. Lett. 71 1997 3394
186. W.P. Kang, A. Wisitsora-at, J.L. Davidson, Q. Li, J.F. Xu, and D.V. Kerns Technical Digest of The 11th IVMC USA 1998 168
187. N.S. Xu, Ph.D. Thesis, Aston University, UK, 1986.
188. R.H. Baughman, A. Auvar, Zakhidov, and W.A. de Heer Science 297 2002 787
189. W.A. De Heer, and R. Martel Phys. World 49 June 2000
190. J. Chen, S.Z. Deng, and N.S. Xu Ultramicroscopy 95 2003 81
191. S. Uemura, J. Yotani, T. Nagasako, H. Kurachi, H. Yamada, T. Ezaki, T. Maesoba, T. Nakao, Y. Saito, and M. Yunura J. SID 11/1 2003 145
192. M.J. Yakaman, M.M. Yoshida, L. Rendon, and J.G. Antiesteban Appl. Phys. Lett. 62 1993 202
193. H.M. Cheng, F. Li, G. Su, H.Y. Pan, L.L. He, X. Sun, and M.S. Dresselhaus Appl. Phys. Lett. 72 1998 3282
194. Z.F. Ren, Z.P. Huang, J.W. Xu, J.H. Wang, P. Bush, M.P. Siegal, and P.N. Provencio Science 282 1998 1105
195. Q. Zhang, S.F. Yoon, J. Ahn, B.G. Busli, M.B. Yu, L.K. Cheah, and X. Shi Int. J. Mod. Phys. B14 2000 289
196. H.J. Dai Phys. World 43 June 2000
197. T.W. Ebbesen, H.J. Lezec, H. Hiura, J.W. Bennett, H.F. Ghaemi, and T. Thio Nature 382 1996 54
198. L. Langer, V. Bayot, E. Grivei, J.P. Issi, J.P. Herenmans, C.H. Olk, L. Stockman, C. Van Haesendonck, and Y. Bruynseraede Phys. Rev. Lett. 76 1996 479
199. H. Dai, E.W. Wong, and C.M. Lieber Science 272 1996 523
200. Z. Yao, C.L. Kane, and Cees Dekker Phys. Rev. Lett. 84 2000 2941
201. J.W.G. Wildœ̌r, L.C. Venema, A.G. Rinzler, R.E. Smalley, and C. Dekker Nature 391 1998 59
202. T.W. Odom, J.-L. Huang, P. Kim, and C.M. Lieber Nature 391 1998 62
203. Stefan Frank, Philippe Poncharal, Z.L. Wang, and W.A. de Heer Science 280 1998 1744
204. Ruiping Gao, Zhengwei Pan, and Z.L. Wang Appl. Phys. Lett. 78 2001 1757
205. J.J. Zhao, J. Han, and J.P. Lu Phys. Rev. B65 2002 193401
206. R. Ramprasad, P. von Allmen, and L.R.C. Fonseca Phys. Rev. B 60 1999 6023
207. O.M. Kuttel, O. Goenong, C. Emmenegger, and L. Schlapbach Appl. Phys. Lett. 73 1998 2113
208. S.J. Chung, S.H. Lim, C.H. Lee, and J. Jang Diamond Relat. Mater. 10 2001 248
209. Z.F. Ren, Z.P. Huang, J.W. Xu, J.H. Wang, P. Bush, M.P. Siegal, and P.N. Provencio Science 282 1988 1105
210. S.J. Chung, S.H. Lim, and J. Jang Thin Solid Film 383 2001 73
211. C. Schonenberger, and L. Forro Phys. World 37 June 2000
212. H.J. Dai, E.W. Wong, Y.Z. Lu, S.S. Fan, and C.M. Lieber Nature 375 1995 796
213. A.G. Rinzler, J.H. Hafner, P. Nikolaev, L. Lou, S.G. Kim, D. Tomanek, P. Nordlander, D.T. Colbert, and R.E. Smalley Science 269 1995 1550
214. X.C. Ma, E.G. Wang, W.Z. Zhou, D.A. Jefferson, J. Chen, S.Z. Deng, N.S. Xu, and J. Yuan Appl. Phys. Lett. 75 1999 3105
215. Y.Y. Wei, G. Eres, V.L. Merkulov, and D.H. Lowndes Appl. Phys. Lett. 78 2001 1394
216. L. Nilsson, O. Groning, C. Emmenegger, O. Kuttel, E. Schaller, L. Schlapbach, H. Kind, J.M. Bonard, and K. Kern Appl. Phys. Lett. 76 2000 2071
217. L. Nilsson, O. Groening, P. Groening, O. Kuettel, and L. Schlapbach J. Appl. Phys. 90 2001 768
218. Y.T. Feng, S.Z. Deng, J. Chen, and N.S. Xu Ultramicroscopy 95 2003 93
219. S.Z. Deng, N.S. Xu, J.B. Liu, J. Chen, Y.L. Ke, and J.C. She Technical Digest of 15th IVMC and 48th IFES Lyon, France 2002 PT.56
220. Yue Chen, N.S. Xu, Internal Report, Zhongshan University, PR China, 2001.
221. Y. Tu, Z.P. Huang, D.Z. Wang, J.G. Wen, and Z.F. Ren Appl. Phys. Lett. 80 2002 4018
222. Yue Chen, Ph.D. Thesis, Zhongshan University, PR China, 2002.
223. H. Murakami, M. Hirakawa, C. Tanaka, and H. Yamakawa Appl. Phys. Lett. 76 2000 1776
224. K.B.K. Teo, M. Chhowalla, G.A.J. Amaratunga, and W.I. Milne Appl. Phys. Lett. 79 2001 1534
225. K.B.K. Teo IEE Rev. April 2003 38
226. J.C. She, N.S. Xu, unpublished.
227. W. Hu, D. Gong, Z. Chen, L. Yuan, K. Saito, C.A. Grimes, and P. Kichambare Appl. Phys. Lett. 79 2001 3083
228. J.M. Bonard, H. Kind, T. Stockli, and L.O. Nilsson Solid-State Electron. 45 2001 893
229. P. Gröning, P. Ruffieux, L. Schlapbach, and O. Gröning Adv. Eng. Mater. 8 2003 541
230. J.M. Bonard, K.A. Dean, B.F. Coll, and C. Klinke Phys. Rev. Lett. 89 2002 197602-1
231. S.T. Purcell, P. Vincent, C. Journet, and V.T. Binh Phys. Rev. Lett. 88 2002 105502-1
232. K.A. Dean, P. von Allmen, and B.R. Chalamala J. Vac. Sci. Technol. B 17 1999 1959
233. N.S. Xu, Yue. Chen, S.Z. Deng, J. Chen, X.C. Ma, and E.G. Wang Chin. Phys. Lett. 18 2001 1278
234. J.M. Bonard, J.P. Salvetat, T. Stôckli, W.A. de Heer, László, and A. Châtelain Appl. Phys. Lett. 73 1998 918
235. N.S. Xu, Y. Chen, S.Z. Deng, J. Chen, X.C. Ma, and E.G. Wang J. Phys. D: Appl. Phys. 34 2001 1597
236. J.M. Bornard, N. Weiss, H. Kind, T. Stôckli, L. Forró, K. Kern, and A. Châtelain Adv. Mat. 13 2001 184
237. Y.T. Feng, Master Thesis, Zhongshan University, PR China, 2003.
238. S.Z. Deng, N.S. Xu, J.B. Liu, J. Chen, Y.L. Ke, J.C. She, Internal Report, Zhongshan University, PR China, 2004.
239. K.A. Dean, and B.R. Chalamala J. Appl. Phys. 85 7 1999 3832
240. K. Hata, A. Takakura, and Y. Saito Surf. Sci. 490 2001 296
241. Z.L. Wang, R.P. Gao, W.A. de Heer, and P. Poncharal Appl. Phys. Lett. 80 2002 856
242. N. de Jonge, Y. Lang, K. Schoots, and T.H. Oosterkmp Nature 420 2002 393
243. N. de Jonge J. Appl. Phys. 95 2004 673
244. V. Semet, V.T. Binh, P. Vincent, D. Guillot, K.B.K. Teo, M. Chhowalla, G.A.J. Amaratunga, W.I. Milne, P. Legagneux, and D. Pribat Appl. Phys. Lett. 81 2002 343
245. J.M. Bonard, C. Klinke, K.A. Dean, and B.F. Coll Phys. Rev. B67 2003 115406
246. J.C. She, N.S. Xu, S.Z. Deng, and J. Chen Appl. Phys. Lett. 83 2003 2671
247. J.C. She, N.S. Xu, S.Z. Deng, and J. Chen Appl. Phys. Lett. 83 2003 5569
248. N.Y. Huang, J.C. She, J. Chen, S.Z. Deng, N.S. Xu, H. Bishop, S.E. Huq, L. Wang, D.Y. Zhong, E.G. Wang, and D.M. Chen Phys. Rev. Lett. 93 2004 075501
249. E.L. Murphy, and R.H. Good Jr. Phys. Rev. 102 1956 1464
250. N.S. Xu R.V. Latham High Voltage Vacuum Insulation: Basic Concepts and Technological Practice 1995 Academic Press London (Chapter 5)
251. A.N. Obraztsov, I. Pavlovsky, A.P. Volkov, E.D. Obraztsova, A.L. Chavilin, and V.L. Kuznetsov J. Vac. Sci. Technol. B18 2000 1059
252. C.J. Edgcombe, and U. Valdré Philos. Mag. B 82 2002 987
253. C.J. Edgcombe, and U. Valdré J. Microsc. 203 2001 188
254. C.J. Edgcombe Philos. Mag. B 82 2002 1009
255. P. Wu, N.S. Xu, unpublished.
256. N.S. Xu, and R.V. Latham Surf. Sci. 274 1992 147
257. C. Oshima, K. Mastuda, T. Kona, Y. Mogami, M. Komaki, Y. Murata, and T. Yamashita Phys. Rev. Lett. 88 2002 38301
258. Y. Saito, K. Hamaguchi, K. Hata, K. Uchida, Y. Tasaka, F. Ikazaki, M. Yumura, A. Kasuya, and Y. Nishina Nature 389 1997 555
259. M.J. Fransen, Th.L. van Rooy, and P. Kruit Appl. Surf. Sci. 146 1999 312
260. N. de Jonge, and N.J. van Druten Ultramicroscopy 95 2003 85
261. R. Schlesser, R. Collazo, C. Bower, O. Zhou, and Z. Sitar Diamond Relat. Mater. 9 2000 1201
262. K.A. Dean, O. Groening, O.M. Kutel, and L. Schlapbach Appl. Phys. Lett. 75 1999 2773
263. D. Lovall, M. Buss, E. Graugnard, R.P. Andres, and R. Reifenberger Phys. Rev. B61 2000 5683
264. V. Filip, D. Nicolaescu, and O. Okuyama J. Vac. Sci. Technol. B19 2001 1016
265. S.-D. Liang, and N.S. Xu Appl. Phys. Lett. 83 2003 1213 unpublished work
266. V. Filip, D. Nicolaescu, and O. Okuyama Ultramicroscopy 89 2001 39
267. R. Saito, G. Dresselhaus, and M.S. Dresselhaus Physical Properties of Carbon Nanotubes 1998 Imperial of College Press
268. R. Saito, M. Fujita, G. Dresselhaus, and M.S. Dresselhaus Appl. Phys. Lett. 60 1992 2204
269. A. De Vita, J.Ch. Charlier, X. Blasé, and R. Car Appl. Phys. A68 1999 283
270. J. Luo, L.M. Peng, Z.Q. Xue, and J.L. Wu Phys. Rev. B66 2002 155407
271. S. Han, and J. Ihm Phys. Rev. B66 2002 241402
272. G. Zhou, and Y. Kawazoe Chem. Phys. Lett. 350 2001 386
273. S. Han, and J. Ihm Phys. Rev. B61 2000 9986
274. G. Zhou, W.H. Duan, and B.L. Gu Phys. Rev. Lett. 87 2001 95504
275. X. Zheng, G.H. Chen, Z.B. Li, S.Z. Deng, and N.S. Xu Phys. Rev. Lett. 92 2004 106803
276. A. Warshel, and M. Levitt J. Mol. Biol. 103 1976 227
277. Ch. Adessi, and M. Devel Phys. Rev. B62 2000 13314
278. Y.-H. Lee, Y.-T. Jang, D.-H. Kim, J.-H. Ahn, and B.-K. Ju Adv. Mater. 13 2001 479
279. G. Pirio, P. Legagneux, D. Pribat, K.B. Kteo, M. Chhowalla, G.A.J. Amaratunga, and W.I. Milne Nanotechnology 13 2002 1
280. V.I. Merkulov, M.A. Guillorn, D.H. Lowndes, M.L. Simpson, and E. Voekl Appl. Phys. Lett. 79 2001 1178
281. M.A. Guilorn, A.V. Melechko, V.I. Mevkulov, D.K. Hensley, M.L. Simpson, and D.H. Lowndes Appl. Phys. Lett. 81 2002 3660
282. M.A. Guilorn, A.V. Melechko, V.I. Mevkulov, E.O. Ellis, C.L. Britton, M.L. Simpson, and D.H. Lowndes Appl. Phys. Lett. 79 2001 2506
283. J.S. She, Y.F. Liao, N.S. Xu, unpublished.
284. N.S. Xu H.S. Nalwa Vacuum Nanoelectronics, Encyclopedia of Nanoscience and Nanotechnology 2004 American Scientific Publishers USA
285. J. Shaw, and J. Itoh Vacuum Microelectronics 2001 Wiley New York (Chapter 5)
286. S.Z. Deng, Z.S. Wu, J. Zhou, N.S. Xu, J. Chen, and J. Chen Chem. Phys. Lett. 356 2002 511
287. Z.W. Pan, H.L. lai, F.C.K. Au, X.F. Duan, W.Y. Zhou, W.S. Shi, N. Wang, C.S. Lee, N.B. Wong, S.T. Lee, and S.S. Xie Adv. Mater. 12 2000 1186
288. H.C. Lo, D. Das, J.S. Hwang, K.H. Chen, C.H. Hsu, C.F. Chen, and L.C. Chen Appl. Phys. Lett. 83 2003 1420
289. X.T. Zhou, N. Wang, F.C.K. Au, H.L. Lai, H.Y. Peng, I. Bello, C.S. Lee, and S.T. Lee Mater. Sci. Eng. A286 2000 119
290. F.G. Tarntair, C.Y. Wen, L.C. Chen, J.J. Wu, K.H. Chen, P.F. Kuo, S.W. Chang, Y.F. Chen, W.K. Hong, and H.C. Cheng Appl. Phys. Lett. 76 2000 2630
291. X.D. Bai, J.D. Guo, J. Yu, E.G. Wang, J. Yuan, and W. Zhou Appl. Phys. Lett. 76 2000 2624
292. Q. Wu, Z. Hu, X. Wang, Y. Lu, K. Huo, S. Deng, N. Xu, B. Shen, R. Zhang, and Y. Chen J. Mater. Chem. 13 2003 2024
293. V.N. Tondare, C. Balasubramanian, S.V. Shende, D.S. Joag, V.P. Godbole, and M. Bhadbhade Appl. Phys. Lett. 80 2002 4813
294. C.J. Lee, T.J. Lee, S.C. Lyu, Y. Zhang, H. Ruh, and H.J. Lee Appl. Phys. Lett. 81 2002 3648
295. Y.W. Zhu, H.Z. Zhang, X.C. Sun, S.Q. Feng, J. Xu, Q. Zhao, B. Xiang, R.M. Wang, and D.P. Yu Appl. Phys. Lett. 83 2003 144
296. C.X. Xu, and X.W. Sun Appl. Phys. Lett. 83 2003 3806
297. H.M. Kim, T.W. Kang, K.S. Chung, J.P. Hong, and W.B. Choi Chem. Phys. Lett. 377 2002 491
298. Y.B. Li, Y. Bando, D. Golberg, and K. Kurashima Appl. Phys. Lett. 81 2003 5048
299. J. Zhou, S.Z. Deng, N.S. Xu, J. Chen, and J.C. She Technical Digest of 15th IVMC and 48th IFES Lyon, France 2002 PM15
300. J. Zhou, S.Z. Deng, N.S. Xu, J. Chen, and J.C. She Appl. Phys. Lett. 83 2003 2653
301. J. Chen, Ph.D. Thesis, Zhongshan University, PR China, 2004.
302. J. Chen, S.Z. Deng, N.S. Xu, W.X. Zhang, X.G. Wen, and S.H. Yang Appl. Phys. Lett. 83 2003 746
303. C.T. Hsieh, J.M. Chen, H.H. Lin, and H.C. Shih Appl. Phys. Lett. 83 2003 3383
304. Y.B. Li, Y. Bando, and D. Golberg Appl. Phys. Lett. 82 2003 1962
305. J. Zhou, N.S. Xu, unpublished.
306. Y.H. Lee, C.H. Choi, Y.T. Jang, E.K. Kim, B.K. Ju, N.K. min, and J.H. Ahn Appl. Phys. Lett. 81 2002 745
307. Z.S. Wu, Master Thesis, Zhongshan University, PR China, 2001.
308. Y.K. Tseng, C.J. Huang, H.M. Cheng, I.N. Lin, K.S. Liu, and I.C. Chen Adv. Funct. Mater. 13 2003 811
309. Y. Chen, S. Patel, Y. Ye, D.T. Shaw, and L. Guo Appl. Phys. Lett. 73 1998 2119
310. J. Zhou, S.Z. Deng, J. Chen, J.C. She, and N.S. Xu Chem. Phys. Lett. 365 2002 505
311. A.M. Morales, and C.M. Lieber Science 279 1998 208
312. X. Jiang, T. Herricks, and Y. Xia Nano. Lett. 2 2002 1333
313. S.H. Wang, and S.H. Yang Adv. Mater. Opt. Electron. 10 2000 39
314. S.H. Wang, and S.H. Yang Chem. Phys. Lett. 332 2000 567
315. S. Wang, Q. Huang, X. Wen, X.Y. Li, and S. Yang Phys. Chem. Chem. Phys. 4 2002 3425
316. O. Madelung Numerical Data and Functional Relationships in Science and Technology-Physics of Non-Tetrahedrally Bonded Elements and Binary Compounds, I, vol. 17(e) 1983 Springer Berlin 137
317. R.H. Good, and E.W. Muller S. Flugge Encyclopedia of Physics, vol. XXI 1956 Springer Berlin 191
318. I.V. Malikov, and G.M. Mikhailov J. Appl. Phys. 82 1997 5555
319. S.L. Zhang, and F.M. d'Heurle Appl. Phys. Lett. 76 2000 1831
320. Y.K. Liu, C.G. Liang, Z.L. Wang, Y.Z. He, X.L. Lan, and M.H. Zhou Jpn. J. Appl. Phys., Part I 39 2000 3915
321. Y. Lui, Y. Qian, M. Zhang, Z. Chen, and C. Wang Mater. Res. Bull. 31 1996 1029
322. Z. Hussain J. Mater. Res. 16 2001 2695
323. H.C. Zeng Inorg. Chem. 37 1998 1967
324. J.N. Yao, K. Hashimoto, and A. Fujishima Nature 355 1992 624
325. A.M. Rao, D. Jacques, R.C. Haddon, W. Zhu, C. Bower, and S. Jin Appl. Phys. Lett. 76 2000 3813
326. A. Modinos, and J.P. Xanthakis Appl. Phys. Lett. 73 1998 13
327. J.E. Jaskie MRS Bull. 21 1996 59
328. X.W. Liu, C.H. Lin, L.T. Chao, and H.C. Shih Mater. Lett. 44 2000 304
329. X.W. Liu, S.H. Tsai, L.H. Lee, M.X. Yang, A.C.M. Yang, I.N. Lin, and H.C. Shih J. Vac. Sci. Technol. B18 2000 1840
330. E.J. Chi, J.Y. Shim, H.K. Baik, and S.M. Lee Appl. Phys. Lett. 71 1997 324
331. M.V. Ugarov, V.P. Ageev, A.V. Karabutov, E.N. Loubnin, S.M. Pimenov, V.I. Konov, and A. Bensaoula Appl. Surf. Sci. 138-139 1999 359
332. Y. Lijuan, L. Junfeng, D. Ning, and C.C. Zhu Ultramicroscopy 79 1999 155
333. H.H. Busta, and R.W. Pryor J. Appl. Phys. 82 1997 5148
334. Y. Yokota, S. Tagwa, and T. Sugino J. Vac. Sci. Technol. B17 1999 642
335. C. Kimura, T. Yamamoto, and T. Sugino Technical Digest of 13th IVMC Guangzhou, PR China 2000 244
336. B.L. McCarson, R. Schlesser, M.T. McClure, and Z. Sitar Appl. Phys. Lett. 72 1998 2909
337. T. Sugino, K. Tanioka, S. Kawasaki, and J. Shirafuji Jpn. J. Appl. Phys. 36 1997 463
338. T. Sugino, S. Kawasaki, K. Tanioka, and J. Shirafuji Appl. Phys. Lett. 71 1997 2704
339. C. Kimua, T. Yamamoto, S. Funakawa, M. Hiakawa, H. Murakam, and T. Sugino Technical Digest of 15th IVMC and 48th IFES Lyon, France 2002 OB3.03
340. A.T. Sowers, J.A. Christman, M.D. Bremser, B.L. Ward, R.F. Davis, and R.J. Nemanich Appl. Phys. Lett. 71 1997 2289
341. W. Wang, H. Zhao, G. Yuan, C. Zhang, and X. Yin Technical Digest of 13th IVMC Guangzhou, PR China 2000 276
342. M. Hajra, N.N. Chubun, A.G. Chakhovskoi, C.E. Hunt, K. Liu, A. Murali, S.H. Risbud, T. Tyler, and V. Zhirnov Technical Digest of 14th IVMC Davis, USA 2001 121
343. M.J. Powers, M.C. Benjamin, L.M. Porter, R.J. Nemanich, R.F. Davis, J.J. Cuomo, G.L. Doll, and S.J. Harris Appl. Phys. Lett. 67 1995 3912
344. J. van der Weide, and R.J. Nemanich Phys. Rev. B49 1994 13629
345. M.C. Benjamin, C. Wang, R.F. Davis, and R.J. Nemanich Appl. Phys. Lett. 64 1994 3288
346. M.C. Benjamin, M.D. Bremser, J.T.W. Weeks, S.W. King, R.F. Davis, and R.J. Nemanich Appl. Surf. Sci. 104/105 1996 455
347. F.M. Charbonnier, W.A. Mackie, and R. Hartman Technical Digest of 14th IVMC Davis, USA 2001 252
348. W.A. Mackie, G.L. Cabe, L.A. Southall, T. Xie, and P.H. McClelland Technical Digest of 14th IVMC Davis, USA 2001 97
349. V.T. Binh, and Ch. Adessi Phys. Rev. Lett. 85 2000 865
350. W.P. Kang, A. Wisitsora-at, J. Cheng, J.L. Davidson, O.K. Tan, W.G. Zhu, Q. Li, and J.F. Xu Technical Digest of 13th IVMC Guangzhou, PR China 2000 256
351. W.P. Kang, A. Wisitsora-at, J.L. Davidson, O.K. Tan, W.G. Zhu, Q. Li, and J.F. Xu Technical Digest of 14th IVMC Davis, USA 2001 119
352. O. Auciello, J.C. Tucek, A. Sumant, J.A. Carlisle, D.M. Gruen, M.Q. Ding, and M. Angadi Technical Digest of 14th IVMC Davis, USA 2001 99
353. N.S. Xu, R.V. Latham, private communication.
354. S. Bajic, Ph.D. Thesis, Aston University, UK, 1989.
355. W. Taylor, S.M. Baigrie, H.E. Bishop, M. Brieley, M.K. Bull, A.P. Burden, J.M. Friday, J.J. Gray, C. Hood, C. Howard, P.G.A. Jones, A.Y. Khazov, W. Lee, R.J. Riggs, G.G. Sheehy, R.A. Tuck, and M.S. Waite Technical Digest of 14th IVMC Davis, USA 2001 177
356. A.A. Talin, K.A. Dean, and J.E. Jaskie Solid State Electron. 45 2001 963
357. D.-S. Chung, S.H. Park, H.W. Lee, J.H. Choi, S.N. Cha, J.W. Kim, J.E. Jang, K.W. Min, S.H. Cho, M.J. Yoon, J.S. Lee, C.K. Lee, J.H. Yoo, J.-M. Kim, J.E. Jung, Y.W. Jin, Y.J. Park, and J.B. You Appl. Phys. Lett. 80 2002 4045
358. S.G. Yu, W. Yi, J. Lee, T. Jeong, S. Jin, J. Heo, J.H. Kang, Y.S. Choi, C.S. Lee, J.-B. Yoo, and J.M. Kim Appl. Phys. Lett. 80 2002 4036
359. N.S. Lee, J.H. Kang, W.B. Choi, Y.S. Choi, Y.J. Park, H.Y. Kim, Y.L. Lee, D.S. Chung, J.E. Jung, C.J. Lee, J.H. Kim, J.H. You, S.H. Jo, C.G. Lee, and J.M. Kim 13th International Vacuum Microelectronics Conference, IVMC 2000 193
360. Y.S. Choi, Y.S. Cho, J.H. Kang, Y.J. Kim, I.H. Kim, S.H. Park, H.W. Lee, S.Y. Hwang, S.J. Lee, C.G. Lee, T.S. Oh, J.S. Choi, S.K. Kang, and J.M. Kim Appl. Phys. Lett. 82 2003 3565
361. D.S. Chung, S.H. Park, Y.W. Jin, J.E. Jung, Y.J. Park, H.W. Lee, T.Y. Ko, S.Y. Hwang, J.W. Kim, N.H. Kwon, M.H. Yoon, C.G. Lee, J.H. You, N.S. Lee, and J.M. Kim IVMC 2001 179
362. P.G. Collins, and A. Zettl Phys. Rev. B 55 1997 9391
363. H. Ren, S.Z. Deng, J. Chen, J.C. She, and N.S. Xu Technical Digest of 15th IVMC and 48th IFES Lyon, France 2002 PM15
364. H. Ren, S.Z. Deng, J. Chen, J.C. She, and N.S. Xu Technical Digest of 16th IVMC Japan 2003
365. J.L. Kwo, M. Yokoyama, C.-C. Lee, F.-Y. Chuang, and I.N. Lin Technical Digest of 13th IVMC Guangzhou, PR China 2000 219
366. D.S. Chung, W.B. Choi, J.H. Kang, H.Y. Kim, I.T. Han, Y.S. Park, Y.H. Lee, N.S. Lee, and J.E. Jung J. Vac. Sci. Technol. B18 2000 1054
367. Y.-R. Cho, J.H. Lee, M.-Y. Jung, Y.-H. Song, S.-Y. Kang, and K.I. Cho Technical Digest of 13th IVMC Guangzhou, PR China 2000 195
368. Y.-R. Cho, J.H. Lee, S.-D. Ahn, B.-C. Kim, Y.-H. Song, C.-S. Hwang, C.H. Chuang, and K.I. Cho Technical Digest of 14th IVMC Davis, USA 2001 67
369. J.W. Nam, Y.S. Jo, M.J. Yoon, H.Y. Kim, M.A. Yu, S.H. Cho, S.J. Lee, H.K. Park, K.S. Choi, J.H. You, N.S. Lee, and J.M. Kim Technical Digest of 14th IVMC Davis, USA 2001 57
370. Y.-R. Cho, J.H. Lee, Y.-H. Song, S.-Y. Kang, C.-S. Hwang, M.-Y. Jung, D.-H. Kim, S.-K. Lee, H.-S. Uhm, and K.I. Cho Mater. Sci. Eng. B79 2001 128
371. D.-S. Chung, S.H. Park, H.W. Lee, J.H. Choi, S.H. Cha, J.W. Kim, J.E. Jang, K.W. Min, S.H. Cho, M.J. Yoon, J.S. Lee, C.K. Lee, J.H. Yoo, J.-M. Kim, J.E. Jung, Y.W. Jin, Y.J. Park, and J.B. You Appl. Phys. Lett. 80 2002 4045
372. J.E. Jung, Y.W. Jin, J.H. Choi, Y.J. Park, T.Y. Ko, D.S. Chung, J.M. Kim, J.E. Jang, S.N. Cha, W.K. Yi, S.H. Cho, M.J. Yoon, C.G. Lee, J.H. You, N.S. Lee, J.B. Yoo, and J.M. Kim Physica B323 2002 71
373. W.-J. Zhao, N. Kawakami, A. Sawada, and M. Takai Technical Digest of 15th IVMC and 48th IFES Lyon, France 2002 OB4.08
374. L. De Forest, US Patent 879,532 (1908).
375. F. Courreges, SID 96 Digest, 1996, p. 45.
376. K. Yoshikawa Proceedings of Japan Display 1992 606
377. C. Bolzer, C.T. Harris, S. Rabe, D.D. Rathman, M.A. Hollis, and H.I. Smith J. Vac. Sci. Technol. B12 1994 629
378. R.L. Hansen, J.C. Dunphy, C.J. Spindt, J.M. Cleeves, J.M. Truppa, G.M. Fink, Y. Iguchi, US Patent 5,564,959 (1996).
379. R.L. Hansen, J.C. Dunphy, C.J. Spindt, J.M. Cleeves, J.M. Truppa, G.M. Fink, Y. Iguchi, US Patent 5,607,335 (1994).
380. L. Branst Semiconductor Int. January 1996 110
381. P.H. Holloway, J. Sebastian, T. Trottier, and H. Swart Solid State Technol. August 1995 47
382. C.G. Lee, S.J. Lee, S.H. Jo, J.S. Lee, T.I.I. Yun, B.G. Lee, J.C. Cha, H.S. Han, S.H. Ahn, K.W. Jung, H.Y. Kim, B.C. Yun, S.M. Park, J.S. Choi, T.S. Oh, S.K. Kang, and J.M. Kim Technical Digest of 15th IVMC and 48th IFES Lyon, France 2002 OB4.01
383. N.S. Lee, J.H. Kang, W.B. Choi, Y.S. Choi, Y.J. Park, H.Y. Kim, Y.J. Lee, D.S. Chung, J.E. Jung, C.J. Lee, J.H. Kim, J.H. You, S.H. Jo, C.G. Lee, and J.M. Kim Technical Digest of 13th IVMC Guangzhou, China 2000 193
384. Y.J. Park, D.S. Chung, Y.W. Jin, J.E. Jung, H.S. Kang, J.W. Kim, J.E. Jang, S.N. Cha, S.H. Cho, K.H. Noh, H.R. Seon, C.H. Lee, C.Y. Park, and J.M. Kim Technical Digest of 15th IVMC and 48th IFES Lyon, France 2002 OB4.03
385. M. Yumura, S. Ohshima, K. Uchida, Y. Tasaka, Y. Kuriki, F. Ikazaki, Y. Saito, and S. Uemura Diamond Relat. Mater. 8 1999 785
386. S.Z. Deng, F. Qian, J. Chen, and N.S. Xu Proceedings of the 46th IFES Pittsburgh, USA 2001
387. J. Chen, S.Z. Deng, and N.S. Xu Ultramicroscopy 95 2003 81
388. T.H.P. Chang, M.G.R. Thomson, E. Kratschmer, H.S. Kim, M.L. Yu, K.Y. Lee, S.A. Rishton, and B.W. Hussey J. Vac. Sci. Technol. B14 1996 3774
389. T.H.P. Chang, M.G.R. Thomson, M.L. Yu, E. Kratschmer, H.S. Kim, K.Y. Lee, S.A. Rishton, and S. Zolgharnain Microelectron. Eng. 32 1996 113
390. T.H.P. Chang, L.P. Muray, U. Staufer, and D.P. Kern Microelectron. Eng. 21 1993 129
391. L.R. Baylor, D.H. Lowndes, M.L. Simpson, and C.E. Thomas J. Vac. Sci. Tech. B20 2002 2646
392. M.A. Guillorn, A.V. Melechko, and V.I. Merkulov Appl. Phys. Lett. 79 2001 3506
393. S.E. Huq, B.J. Kent, R. Stevens, R.A. Lawes, N.S. Xu, and J.C. She J. Vac. Sci. Technol. B19 2001 988
394. D. Morris, B. Gilchrist, and A. Gallimore 36th AIAA/ASME/SEA/ASEE Joint Propulsion Conference 16-19 July 2000, Huntsville Alabama, USA 2000
395. C. Marresse, and J. Polk AIAA 2000 2000
396. M. Tajmar AIAA Survery of FEEP Neutraliser Options, ARC Sibersdorf Research, Austria, 38th AIAA/ASME/SAE/ASEE Joint Propulsion Conference and Exhibit 7-10 July 2002, Indiana, USA 2002 1 10
397. C. Marresse, J. Polk, J. Mueller, A. Owens, M. Tajmar, R. Fink, and C. Spindt International Electric Propulsion Conference IEPC-01 2001 290
398. B. Kent, S.E. Huq, unpublished.
399. K.L. Jenson, Y.Y. Lau, and D.S. McGregor Appl. Phys. Lett. 77 2000 585
400. J.M. Chamberlain, R.E. Miles, J. Garcia-Garcia, C.J. Mann, S.E. Huq, and M. Oldfield Proceedings of 10th IEEE Conference on Terahertz Electronics 2002 0-7803-7630-7 117 120
401. L.P. Muray, J.P. Spallas, C. Steller, K. Lee, M. Mankos, Y. Hsn, M. Gmur, and T.H.P. Chang J. Vac. Sci. Technol. B18 2000 3099
402. D. Gibson, Ultra-high density storage device, US Patent 5,557,596 (1996).
403. S.T. Lam Technical Digest of 14th IVMC Davis, USA 2001 135
404. M. Nanba, T. Yamagishi, S. Okazaki, K. Tanioka, N. Egami, and F. Sato Tech. Rep. IEICE 96 1996 13
405. M. Nanba, T. Yamagishi, S. Okazaki, K. Tanioka, K. Takayama, M. Tanaka, and S. Itoh Tech. Rep. IEICE 97 1997 19
406. N. Egami, K. Goto, M. Nanba, and S. Okazaki Tech. Rep. IEICE 94 1994 1
407. P.W. Hawkes, and E. Kasper Principles of Electron Optics II: Applied Geometrical Optics 1996 Academic Press London
408. P.W. Hawkes, and E. Kasper Principles of Electron Optics III: Wave Optics 1996 Academic Press London
409. O. Groning, O.M. Kuttel, C. Emmenegger, P. Groning, and L. Schlapbach J. Vac. Sci. Technol. B 18 2000 665
410. J.M. Bonard, J.-P. Salvetat, T. Stôckli, László, and A. Châtelain Appl. Phys. A 73 1999 245
411. L. Dong, J. Jiao, D.W. Tuggle, J.M. Petty, S.A. Elliff, and M. Coulter Appl. Phys. Lett. 82 2003 1096
412. W.J. Zhang, Y. Wu, W.K. Wong, X.M. Meng, C.Y. Chan, I. Bello, Y. Lifshitz, and S.T. Lee Appl. Phys. Lett. 83 2003 3365
413. Z.B. Li, X.W. Liu, N.S. Xu, S.Z. Deng, J. Chen, M.M. Wu, S. Ren, J. Chen, and F.L. Zhao Ultramicroscopy 95 2003 75
414. N.S. Xu, Z.B. Li, W.G. Xie, unpublished.