Interference assisted lithography for patterning of 1D gridded design

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Greenway, Robert T ^b   Hendel, Rudolf ^a   Jeong, Kwangok ^c   Kahng, Andrew B ^c   Petersen, John S ^b   Rao, Zhilong ^a   Smayling, Michael C ^d  

^a APPLIED MATERIALS INC   (United States)

^b Petersen Advanced Lithography Inc   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

^d Tela Innovations Inc   (United States)

Author keywords

Double exposure; Interference lithography; Regular design; SRAM

Indexed keywords

6T-SRAM; BITCELL; COST-EFFECTIVE SOLUTIONS; DESIGN RULES; DOUBLE EXPOSURE; ELECTRICAL CHARACTERISTIC; INTERFERENCE LITHOGRAPHY; LITHOGRAPHY SIMULATION; RANDOM LAYOUT; REGULAR DESIGN; SRAM;

PHOTOLITHOGRAPHY; STATIC RANDOM ACCESS STORAGE;

DESIGN;

EID: 65849222177     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.812033     Document Type: Conference Paper

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