Economic assessment of lithography strategies for the 22nm technology node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7488, Issue , 2009, Pages

  Jhaveri, Tejas ^a   Strojwas, Andrzej ^a   Pileggi, Larry ^a   Rovner, Vyacheslav ^a  

^a CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

Cost per good die; Economics; Lithography; Scaling

Indexed keywords

CONTACT LAYERS; COST-PER-GOOD-DIE; DIRECT WRITE; DOUBLE PATTERNING; ECONOMIC ASSESSMENTS; ECONOMIC BENEFITS; ECONOMICAL FEASIBILITY; EXTREME ULTRAVIOLETS; HIGH VOLUME PRODUCTS; LITHOGRAPHY PROCESS; MASK OPTIMIZATION; MASS PRODUCTION; PROCESS COSTS; PRODUCT YIELDS; SCALING; SELECTION OF THE BEST; TECHNOLOGY NODES; VOLUME PRODUCTION;

COST BENEFIT ANALYSIS; COSTS; DIES; NANOTECHNOLOGY; OPTIMIZATION; PHOTOMASKS; TECHNOLOGY; TITRATION;

LITHOGRAPHY;

EID: 77953274858     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.837240     Document Type: Conference Paper

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