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Applied Physics Letters

Volumn 92, Issue 17, 2008, Pages

Three dimensional silicon-air photonic crystals with controlled defects using interference lithography

(5) Ramanan, V a Nelson, E a Brzezinski, A a Braun, P V a Wiltzius, P a,b

a United States of America (United States)

b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; CHEMICAL VAPOR DEPOSITION; LASER RADIATION; LITHOGRAPHY; PHOTORESISTS; SILICON; THREE DIMENSIONAL;

BAND GAP FREQUENCIES; CONCURRENT EXPOSURE; REFLECTANCE PEAKS; TWO PHOTON POLYMERIZATION;

PHOTONIC CRYSTALS;

EID: 43049141486 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.2919523 Document Type: Article

Times cited : (50)

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