Glassy mAs2S3·nAs2Se3 photoresist films for interference laser lithography

Optical Materials

Volumn 26, Issue 3, 2004, Pages 301-304

  Arsh, A ^a   Klebanov, M ^a   Lyubin, V ^a   Shapiro, L ^a   Feigel, A ^b   Veinger, M ^b   Sfez, B ^b  

^a BEN GURION UNIVERSITY OF THE NEGEV   (Israel)

^b Electro Optics Division   (Israel)

Author keywords

Chalcogenide glassy films; Interference laser lithography; Photonic crystals; Spectra of refractive index

Indexed keywords

DISSOLUTION; HELIUM NEON LASERS; LASER BEAM EFFECTS; LIGHT INTERFERENCE; NEODYMIUM LASERS; PHOTORESISTS; REFRACTIVE INDEX;

CHALCOGENIDE GLASSY FILMS; INTERFERENCE LASER LITHOGRAPHY; PHOTONIC CRYSTALS; SPECTRA OF REFRACTIVE INDEX;

OPTICAL FILMS;

EID: 3042719121     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2003.12.013     Document Type: Article

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