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Applied Physics A: Materials Science and Processing

Volumn 101, Issue 2, 2010, Pages 237-241

Large-area micro/nanostructures fabrication in quartz by laser interference lithography and dry etching

(6) Liu, C H a,b Hong, M H a,c Lum, M C b Flotow, H b Ghadessy, F b Zhang, J B c

a NATIONAL UNIVERSITY OF SINGAPORE (Singapore)

b Agency for Science (Singapore)

c DATA STORAGE INSTITUTE (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING PROCESS; GOLD FILM; GOLD NANOPARTICLES; HARD MASKS; LASER INTERFERENCE LITHOGRAPHY; MICRO HOLES; MICRO/NANOSTRUCTURES; THIN GOLD FILM;

ELECTROMAGNETIC INDUCTION; ELECTROMAGNETIC LAUNCHERS; GOLD; GOLD COATINGS; INDUCTIVELY COUPLED PLASMA; LITHOGRAPHY; METALLIC FILMS; PHOTORESISTS; PLASMA ETCHING; QUARTZ; REACTIVE ION ETCHING; SILICA; SURFACE ROUGHNESS;

DRY ETCHING;

EID: 78049351334 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-010-5807-9 Document Type: Article

Times cited : (21)

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