Spatial phase-locked combination lithography for photonic crystal devices

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 417-422

  Moormann, C ^a   Bolten, J ^a   Kurz, H ^a  

^a AMO GMBH   (Germany)

Author keywords

Combination lithography; Interference lithography; Photonic crystal device; Spatial phase locked electron beam lithography

Indexed keywords

CRYSTALS; ELECTRON BEAMS; HOLOGRAPHY; MATHEMATICAL MODELS; PHOTONS; RADIO INTERFERENCE; SEMICONDUCTOR MATERIALS; WAVEGUIDES;

COMBINATION LITHOGRAPHY; INTERFERENCE LITHOGRAPHY; PHOTONIC CRYSTAL DEVICE; SPATIAL PHASE-LOCKED ELECTRON BEAM LITHOGRAPHY;

LITHOGRAPHY;

EID: 2542480366     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00148-0     Document Type: Conference Paper

References (7)

1. Yablonovitch E. J. Phys.: Condens. Matter. 5:1993;2443.
2. Loncar M., Nedeljković D., Doll T., Vuć ković J., Scherer A., Pearsall T.P., et al. Appl. Phys. Lett. 77(13):2000;1937.
3. Tokushima M., Kosaka H., Tomita A., Yamada H. Appl. Phys. Lett. 76:2000;952.
4. Campbell M., Sharp D., Harrison M., Denning R., Turberfield A. Nature (London). 404:2000;53.
5. Murakowski J., Schneider G., Venkataraman S., Prather D.W. JVST B. 22:2004;146.
6. Brueck J., Zaidi S.H., Chen X., Zhang Z. Microelectron. Eng. 42:1998;145.
7. Hastings J.T., Zhang F., Goodberlet J.G., Smith H. Microelectron. Eng. 53:2000;361.