Nanolithography with coherent extreme ultraviolet light

Journal of Physics D: Applied Physics

Volumn 39, Issue 10, 2006, Pages

  Solak, Harun H ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; LIGHT INTERFERENCE; OPTICAL RESOLVING POWER; OPTICAL SYSTEMS; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

ACHROMATIC INTERFERENCE; DIFFRACTION (GRATINGS) OPTICS; EXTREME ULTRAVIOLET INTERFERENCE LITHOGRAPHY (EUV-IL); MAGNETIC NANODOT ARRAYS;

NANOTECHNOLOGY;

EID: 33646741447     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/39/10/R01     Document Type: Review

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