Fabrication and measurement of large-area sub-wavelength structures with broadband and wide-angle antireflection effect

Microelectronic Engineering

Volumn 87, Issue 5-8, 2010, Pages 1323-1327

  Chen, Yung Pin ^a   Chiu, Hsin Chieh ^a   Chen, Guan Yu ^a   Chiang, Chieh Hsiu ^a   Tseng, Ching Tung ^a   Lee, Chih Hsien ^a   Wang, Lon A ^a  

^a Graduate Institute of Photonics and Optoelectronics   (Taiwan)

Author keywords

Antireflection; Interference lithography; Sub wavelength structures; Varied angle reflectometer

Indexed keywords

ANTI-REFLECTION; ANTI-REFLECTION EFFECTS; BROADBAND OPERATION; INCIDENT ANGLES; INTERFERENCE LITHOGRAPHY; SI SUBSTRATES; SUB-WAVELENGTH STRUCTURES;

OPTICAL INSTRUMENTS; PHOTOLITHOGRAPHY; REFLECTION; REFLECTOMETERS;

REACTIVE ION ETCHING;

EID: 76949096275     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.12.054     Document Type: Article

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