Patterning at the nanoscale: Atomic force microscopy and extreme ultraviolet interference lithography

Materials Science and Engineering: B

Volumn 165, Issue 3, 2009, Pages 227-230

  Parisse, P ^a   Luciani, D ^a   D'Angelo, A ^a   Santucci, S ^a   Zuppella, P ^a   Tucceri, P ^a   Reale, A ^a   Ottaviano, L ^a  

^a UNIVERSITY OF L'AQUILA   (Italy)

Author keywords

Atomic force microscopy; Extreme ultraviolet laser; Nanolithography

Indexed keywords

NANOLITHOGRAPHY; ULTRAVIOLET LASERS;

ATOMIC-FORCE-MICROSCOPY; CONVENTIONAL METALS; EXTREME ULTRAVIOLET INTERFERENCE LITHOGRAPHIES; EXTREME ULTRAVIOLET LASERS; LIFT-OFF PROCESS; METAL DEPOSITION; NANO INDENTATION; NANO SCALE; NANO-OXIDATION; THIN LAYERS;

ATOMIC FORCE MICROSCOPY;

EID: 71649106734     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2009.07.003     Document Type: Article

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