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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2617-2621

Generalized scanning beam interference lithography system for patterning gratings with variable period progressions

(6) Pati, G S a Heilmann, R K a Konkola, P T a Joo, C a Chen, C G a Murphy, E a

a MASSACHUSETTS INSTITUTE OF TECHNOLOGY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; BIREFRINGENCE; CLOSED LOOP CONTROL SYSTEMS; DIFFRACTION; DIFFRACTION GRATINGS; INTERFEROMETRY; LASER BEAMS; LIGHT INTERFERENCE; LIGHT REFLECTION; MIRRORS; OPTICAL BEAM SPLITTERS; OPTICAL INSTRUMENT LENSES;

CLOSED LOOP BEAM STEERING CONTROL; DIELECTRIC WEDGE-ANGLE BEAM SPLITTER; GENERALIZED SCANNING BEAM INTERFERENCE LITHOGRAPHY; INTERFEROMETRIC PATTERNING; PATTERNING GRATING;

PHOTOLITHOGRAPHY;

EID: 0036883128 PISSN: 0734211X EISSN: None Source Type: Journal
DOI: 10.1116/1.1520563 Document Type: Article

Times cited : (39)

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