Contrast in four-beam-interference lithography

Optics Letters

Volumn 33, Issue 13, 2008, Pages 1434-1436

  Stay, Justin L ^a   Gaylord, Thomas K ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICS; OPTOELECTRONIC DEVICES;

BRAVAIS LATTICES; FACE-CENTERED CUBIC; FOUR-BEAM INTERFERENCE; INTERFERENCE PATTERNS; LINEARLY POLARIZED; MONOCHROMATIC PLANE WAVES; SIMPLE CUBIC;

ELECTRON EMISSION;

EID: 47549107631     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.33.001434     Document Type: Article

References (9)

1. M. Campbell, D. N. Sharp, M. T. Harrison, R. G. Denning, and A. J. Turberfield, Nature 404, 53 (2000).
2. A. Chelnokov, S. David, K. Wang, F. Marty, and J. M. Lourtioz, IEEE J. Sel. Top. Quantum Electron. 8, 919 (2002).
3. L. Pang, W. Nakagawa, and Y. Fainman, Appl. Opt. 42, 5450 (2003).
4. S. Venkataraman, G. J. Schneider, J. Murakowski, S. Shi, and D. W. Prather, Appl. Phys. Lett. 85, 2125 (2004).
5. L. Z. Cai, X. L. Yang, and Y. R. Wang, Opt. Lett. 27, 900 (2002).
6. W. Mao, Y. Zhong, J. Dong, and H. Wang, J. Opt. Soc. Am. B 22, 1085 (2005).
7. J. L. Stay and T. K. Gaylord, Appl. Opt. 47, 3221 (2008).
8. L. Z. Cai, X. L. Yang, and Y. R. Wang, Opt. Lett. 26, 1858 (2001).
9. L. Z. Cai, X. L. Yang, and Y. R. Wang, J. Opt. Soc. Am. A 19, 2238 (2002).