Controlling large-scale film morphology by phase manipulation in interference lithography

Applied Optics

Volumn 46, Issue 29, 2007, Pages 7202-7206

  Lu, Cheng ^a   Hu, X K ^a   Dimov, S S ^a   Lipson, R H ^a  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; LASER BEAMS; PHOTORESISTS;

FILM MORPHOLOGY; INTERFERENCE LITHOGRAPHY; INVERSE-LIKE STRUCTURE; MECHANICAL GEOMETRY;

LITHOGRAPHY;

EID: 37549019655     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.46.007202     Document Type: Article

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