Progress in extreme ultraviolet interferometric and holographic lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2145-2150

  Isoyan, A ^a   Cheng, Y C ^a   Jiang, F ^a   Wallace, J ^a   Cerrina, F ^a   Bollepalli, S ^b  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRAL DIFFRACTION THEORY; NANOPATTERNING; TRANSMISSION INTERFEROMETRIC GRATINGS;

DIFFRACTION EFFICIENCY; HOLOGRAPHY; MATHEMATICAL MODELS; SYNCHROTRON RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 37149051218     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2794069     Document Type: Article

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