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Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 410-416

Space-invariant multiple-beam achromatic EUV interference lithography

(1) Solak, Harun H a

a PAUL SCHERRER INSTITUTE (Switzerland)

Author keywords

Diffraction grating; Extreme ultraviolet; Interference lithography; Multiple beam; Undulator

Indexed keywords

ARRAYS; BANDWIDTH; DIFFRACTION GRATINGS; ELECTRONIC EQUIPMENT; MAGNETIC STORAGE; MONOCHROMATORS; OPTICAL FILTERS; POLYMETHYL METHACRYLATES; SYNCHROCYCLOTRONS; ULTRAVIOLET RADIATION; WAVE INTERFERENCE;

EXTREME ULTRAVIOLET; INTERFERENCE LITHOGRAPHY; MULTIPLE BEAMS; UNDULATORS;

LITHOGRAPHY;

EID: 14944387092 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2005.01.012 Document Type: Conference Paper

Times cited : (23)

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