Methods for fabricating arrays of holes using interference lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2439-2443

  Fernandez, A ^a   Decker, J Y ^a   Herman, S M ^a   Phillion, D W ^a   Sweeney, D W ^a   Perry, M D ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001741379     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589662     Document Type: Article

References (11)

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4. A. Fernandez, H. T. Nguyen, J. A. Britten, R. D. Boyd, D. R. Kania, A. M. Hawryluk, and M. D. Perry, J. Vac. Sci. Technol. B 15, 729 (1997).
5. S. H. Zaidi, and S. R. J. Brueck, J. Vac. Sci. Technol. B 11, 658 (1993).
6. A. Fernandez, P. J. Bedrossian, S. L. Baker, S. P. Vernon, and D. R. Kania, IEEE Trans. Magn. 32, 4472 (1996).
7. R. Dammel, Diazonaphthoquinone-based Resists (SPIE, Bellingham, WA, 1993), pp. 140-145.
8. H. Klose, R. Siguish, and W. Arden, IEEE Trans. Electron Devices 32, 1654 (1985).
9. J. Y. Decker, A. Fernandez, and D. W. Sweeney, J. Vac. Sci. Technol. B (accepted for publication).
10. A. Fernandez and D. W. Phillion, J. Appl. Opt. (in press).
11. Embedded in the derivation of Eq. (1) is a coordinate shift that depends on the phase constants of the beams. For more details, see Ref. 10.