Three-beam interference lithography: Upgrading a Lloyd's interferometer for single-exposure hexagonal patterning

Optics Letters

Volumn 34, Issue 12, 2009, Pages 1783-1785

  De Boor, Johannes ^a   Geyer, Nadine ^a   Gösele, Ulrich ^a   Schmidt, Volker ^a  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

MIRRORS; PHOTORESISTS;

HEXAGONAL SYMMETRY; LLOYD'S MIRROR; PATTERN PERIODICITY; PHOTORESIST PATTERNS; SINGLE EXPOSURE; THREE BEAMS; TWO BEAMS;

INTERFEROMETERS;

EID: 67649354952     PISSN: 01469592     EISSN: 15394794     Source Type: Journal    
DOI: 10.1364/OL.34.001783     Document Type: Article

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