High-efficiency diffractive beam splitters surface-structured on submicrometer scale using deep-UV interference lithography

Applied Optics

Volumn 48, Issue 27, 2009, Pages 5105-5113

  Amako, Jun ^a   Sawaki, Daisuke ^a   Fujii, Eiichi ^a  

^a SEIKO EPSON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EFFICIENCY; FUSED SILICA; HIGH POWER LASERS; LASER APPLICATIONS; OPTICAL INSTRUMENTS; PRISMS;

ANTI-REFLECTIVE LAYERS; DIFFRACTIVE BEAM SPLITTER; DIFFRACTIVE SURFACES; FRESNEL REFLECTIONS; INTERFERENCE FRINGE; INTERFERENCE LITHOGRAPHY; SUBMICROMETER SCALE; SURFACE STRUCTURING;

REACTIVE ION ETCHING;

EID: 70349488052     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.48.005105     Document Type: Article

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