Recording different geometries of 2D hexagonal photonic crystals by choosing the phase between two-beam interference exposures

Optics Express

Volumn 14, Issue 19, 2006, Pages 8578-8583

  Menezes, J W ^a   Cescato, L ^a   De Carvalho, E J ^a   Braga, E S ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL LATTICES; GEOMETRICAL OPTICS; PHASE SHIFT; PHOTONS; SIGNAL INTERFERENCE;

BEAM INTERFERENCES; DIFFERENT GEOMETRIES; HEXAGONAL PHOTONIC CRYSTALS; LATTICE GEOMETRIES;

CRYSTALLOGRAPHY;

EID: 33748946583     PISSN: 10944087     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.14.008578     Document Type: Article

References (18)

1. S. R. J. Brueck, "Optical and Interferometric Lithography Nanotechnology Enablers," Proc. IEEE 93, 1704 (2005).
2. A. Fernandez, J. Y. Decker, S. M. Herman, D. W. Phillion, D. W. Sweeney and M. D. Perry, "Methods for fabricating arrays of holes using interference lithography," J. Vac. Sci. Technol. B 15, 2439-2443 (1997).
3. L. Pang, W. Nakagawa and Y. Fainman, "Fabrication of two-dimensional photonic crystals with controlled defects by use of multiple exposures and direct write," Appl. Opt. 42, 5450-5456 (2003).
4. F. Quiñónez, J. W. Menezes, V. F. Rodriguez-Esquerre, H. Hernandez-Figueroa, R. D. Mansano and L. Cescato, "Band gap of hexagonal 2D photonic crystals with elliptical holes recorded by interference lithography," Opt. Express 14, 4873-4879 (2006)
5. M. Campbel, D. N. Sharp, M. T. Harrison, R. O. Denning and A. J. Turberfield, "Fabrication of photonic crystals for the visible spectrum by holographic lithography," Nature 404, 53-56 (2000).
6. D. N. Sharp, M. Campbell, E. R. Dedman, M. T. Harrison, R. G. Denning and A. J. Turberfield, "Photonic crystals for the visible spectrum by holographic lithography," Opt. Quantum Electron. 34, 3-12 (2002).
7. N. D. Lai, W. P. Liang, J. H. Lin, C. C. Hsu and C. H. Lin, "Fabrication of two- and three-dimensional periodic structures by multi-exposure of two-beam interference technique," Opt. Express 13, 9605-9611 (2005).
8. L. Cescato and J. Frejlich, Three-Dimensional Holographic Imaging (Wiley-Interscience Publication, 2002), Chap. 3.
9. A. A. Talin, K. A. Dean and J. E. Jaskie, "Field emission displays: a critical review," Solid State Electron. 45, 963-976 (2001).
10. L. E. Gutierrez-Rivera, E. J. de Carvalho, M. A. Silva and L. Cescato, "Metallic submicrometer sieves fabricated by interferometric lithography and electroforming," J. Micromech. Microeng. 15, 1932-1937 (2005).
11. J. D. Joannopoulos, R. D. Meade and J. N. Winn, Photonic Crystals (Princeton University Press, 1995).
12. N. D. Lai, W. P. Liang, J. H. Lin and C. C. Hsu, "Rapid fabrication of large-area periodic structures containing well-defined defects by combining holography and mask techniques," Opt. Express 13, 5331-5337 (2005).
13. C. A. Mack, "Development of positive photoresists," J. Electrochem. Soc. 134, 148-152 (1987).
14. B. A. Mello, I. F. Costa, C. R. A. Lima and L. Cescato, "Developed profile of holographically exposed photoresist gratings," Appl. Opt. 34, 597-601 (1995).
15. V. Berger, O. Gauthier-Lafaye and E. Costard, "Photonic band gaps and holography," J. Appl. Phys. 82, 60-64 (1997).
16. M. Breide, S. Johansson, L. E. Nilsson and H. Ahlèn, "Blazed Holographic Gratings", Opt. Acta 26, 1427-1441 (1979).
17. C. M. B. Cordeiro, A. A. Freschi, L. Li and L. Cescato, "Measurement of phase differences between the diffracted orders of deep relief gratings," Opt. Letters 28, 683-685 (2003).
18. A. A. Freschi, F. J. dos Santos, E. L. Rigon and L. Cescato, "Phase-locking of superimposed diffractive gratings in photoresists," Opt. Commun. 208, 41-49 (2002).