Materials Issues for High-k Gate Dielectric Selection and Integration

Springer Series in Advanced Microelectronics

Volumn 16, Issue , 2005, Pages 253-286

  Wallace, R M ^a   Wilk, G D ^a  

^a NONE

Author keywords

Apply Physic Letter; Atomic Layer Deposition; Gate Dielectric; Gate Electrode; Metal Gate

Indexed keywords

EID: 85103550271     PISSN: 14370387     EISSN: 21976643     Source Type: Book Series    
DOI: 10.1007/3-540-26462-0_9     Document Type: Chapter

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