Specific structural factors influencing on reliability of CVD-HfO2

IEEE Symposium on VLSI Circuits, Digest of Technical Papers

Volumn , Issue , 2002, Pages 26-27

  Harada, Yoshinao ^a   Niwa, Masaaki ^a   Lee, Sungjoo ^a   Kwong, Dim Lee ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIFFUSION; GATES (TRANSISTOR); HAFNIUM COMPOUNDS; INTERFACES (MATERIALS); LEAKAGE CURRENTS; STOICHIOMETRY; SUBSTRATES;

GATE DIELECTRICS;

DIELECTRIC MATERIALS;

EID: 0036053768     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)