Interface reactions of high-κ Y2O3 gate oxides with Si

Applied Physics Letters

Volumn 79, Issue 15, 2001, Pages 2447-2449

  Busch, B W ^a   Kwo, J ^a   Hong, M ^a   Mannaerts, J P ^a   Sapjeta, B J ^a   Schulte, W H ^b   Garfunkel, E ^b   Gustafsson, T ^b  

^a AGERE SYSTEMS   (United States)

^b RUTGERS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035828615     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1406989     Document Type: Article

References (10)

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