Use of metal-oxide-semiconductor capacitors to detect interactions of Hf and Zr gate electrodes with SiO2 and ZrO2

Applied Physics Letters

Volumn 78, Issue 26, 2001, Pages 4166-4168

  Misra, Veena ^a   Heuss, Greg P ^a   Zhong, Huicai ^a  

^a North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035948001     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1380240     Document Type: Article

References (7)

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