메뉴 건너뛰기




Volumn 1, Issue 1, 2008, Pages 261-291

Plasma diagnostics for unraveling process chemistry

Author keywords

Deposition; Etching; Gas surface interactions; Surface modification

Indexed keywords

DIAGNOSTIC TOOLS; ELECTRONIC CONFIGURATION; ETCHING GAS; GAS-SURFACE INTERACTIONS; MOLECULE SURFACE; OPTICAL DIAGNOSTIC TOOLS; PLASMA PROCESSING; PLASMA SPECIES; PROCESS CHEMISTRY; SPECIES DENSITY; SURFACE MODIFICATION;

EID: 74949141124     PISSN: 19361327     EISSN: 19361335     Source Type: Book Series    
DOI: 10.1146/annurev.anchem.1.031207.112953     Document Type: Review
Times cited : (31)

References (151)
  • 3
    • 0002004105 scopus 로고
    • Optical diagnostic techniques for low pressure plasmas and plasma processing
    • ed. O Auciello, DF Flamm. Boston: Academic
    • Donnelly VM. 1989. Optical diagnostic techniques for low pressure plasmas and plasma processing. In Plasma Diagnostics, ed. O Auciello, DF Flamm. Boston: Academic
    • (1989) Plasma Diagnostics
    • Donnelly, V.M.1
  • 4
    • 0020703135 scopus 로고
    • Optical techniques in plasma diagnostics
    • Gottscho RA, Miller TA. 1984. Optical techniques in plasma diagnostics. Pure Appl. Chem. 36:189-208
    • (1984) Pure Appl. Chem. , vol.36 , pp. 189-208
    • Gottscho, R.A.1    Miller, T.A.2
  • 5
    • 0242621428 scopus 로고    scopus 로고
    • Diagnostics for plasma processing (etching plasmas)
    • Hershkowitz N, Breun RA. 1997. Diagnostics for plasma processing (etching plasmas). Rev. Sci. Instrum. 68:880-885
    • (1997) Rev. Sci. Instrum. , vol.68 , pp. 880-885
    • Hershkowitz, N.1    Breun, R.A.2
  • 6
    • 8544249899 scopus 로고    scopus 로고
    • Cavity ringdown laser absorption spectroscopy: History, development, and application to pulsed molecular beams
    • Schere JJ, Paul JB, O'Keefe A, Saykally RJ. 1997. Cavity ringdown laser absorption spectroscopy: history, development, and application to pulsed molecular beams. Chem. Rev. 97:25-51
    • (1997) Chem. Rev. , vol.97 , pp. 25-51
    • Schere, J.J.1    Paul, J.B.2    O'Keefe, A.3    Saykally, R.J.4
  • 7
    • 0031245177 scopus 로고    scopus 로고
    • A guide to laser-induced fluorescence diagnostics in plasmas
    • Freegarde TGM, Hancock G. 1997. A guide to laser-induced fluorescence diagnostics in plasmas. J. Phys. IV 7:15-29
    • (1997) J. Phys. IV , vol.7 , pp. 15-29
    • Freegarde, T.G.M.1    Hancock, G.2
  • 9
    • 0000251646 scopus 로고    scopus 로고
    • Trace rare gases optical emission spectroscopy: Nonintrusive method for measuring electron temperatures in lowpressure, low-temperature plasmas
    • Malyshev MV, Donnelly VM. 1999. Trace rare gases optical emission spectroscopy: nonintrusive method for measuring electron temperatures in lowpressure, low-temperature plasmas. Phys. Rev. E 60:6016-6029
    • (1999) Phys. Rev. e , vol.60 , pp. 6016-6029
    • Malyshev, M.V.1    Donnelly, V.M.2
  • 10
    • 0001012541 scopus 로고
    • Plasma kinetic measurements using time-resolved actinometry: Comparisons with laser-induced fluorescence
    • Hancock G, Sucksmith JP, Toogood MJ. 1990. Plasma kinetic measurements using time-resolved actinometry: comparisons with laser-induced fluorescence. J. Phys. Chem. 94:3269-3272
    • (1990) J. Phys. Chem. , vol.94 , pp. 3269-3272
    • Hancock, G.1    Sucksmith, J.P.2    Toogood, M.J.3
  • 12
    • 0032359991 scopus 로고    scopus 로고
    • Optical self-absorption technique for qualitative measurement of excited-state densities in plasma reactors
    • Miller PA, Hebner GA, Jarecki RL. 1998. Optical self-absorption technique for qualitative measurement of excited-state densities in plasma reactors. J. Vac. Sci. Technol. A 16:3240-3246
    • (1998) J. Vac. Sci. Technol. A , vol.16 , pp. 3240-3246
    • Miller, P.A.1    Hebner, G.A.2    Jarecki, R.L.3
  • 13
    • 0033748662 scopus 로고    scopus 로고
    • Laser-induced resonance fluorescence as a diagnostic technique in nonthermal equilibrium plasmas
    • Amorim J, Baravian G, Jolly J. 2000. Laser-induced resonance fluorescence as a diagnostic technique in nonthermal equilibrium plasmas. J. Phys. D: Appl. Phys. 33:R51-65
    • (2000) J. Phys. D: Appl. Phys. , vol.33
    • Amorim, J.1    Baravian, G.2    Jolly, J.3
  • 14
    • 0030596221 scopus 로고    scopus 로고
    • Absolute concentration measurements by pulsed laser-induced fluorescence in low-pressure gases: Allowing for saturation effects
    • Cunge G, Booth JP, Derouard J. 1996. Absolute concentration measurements by pulsed laser-induced fluorescence in low-pressure gases: allowing for saturation effects. Chem. Phys. Lett. 263:645-650
    • (1996) Chem. Phys. Lett. , vol.263 , pp. 645-650
    • Cunge, G.1    Booth, J.P.2    Derouard, J.3
  • 16
    • 33947670902 scopus 로고    scopus 로고
    • Laser-based plasma particle analysis of the surface in a discharge
    • Sakurai T. 2007. Laser-based plasma particle analysis of the surface in a discharge. Plasma Sources Sci. Technol. 16:S101-6
    • (2007) Plasma Sources Sci. Technol. , vol.16
    • Sakurai, T.1
  • 18
    • 0038043998 scopus 로고
    • Direct measurement of velocity space transport in a plasma
    • Bowles J, McWilliams R, Rynn N. 1994. Direct measurement of velocity space transport in a plasma. Phys. Plasmas 1:3814-3825
    • (1994) Phys. Plasmas , vol.1 , pp. 3814-3825
    • Bowles, J.1    McWilliams, R.2    Rynn, N.3
  • 20
  • 22
    • 0000494853 scopus 로고    scopus 로고
    • A modified molecular beam instrument for the imaging of radicals interacting with surfaces during plasma processing
    • McCurdy PR, Bogart KHA, Dalleska NF, Fisher ER. 1997. A modified molecular beam instrument for the imaging of radicals interacting with surfaces during plasma processing. Rev. Sci. Instrum. 68:1684-1693
    • (1997) Rev. Sci. Instrum. , vol.68 , pp. 1684-1693
    • McCurdy, P.R.1    Kha, B.2    Dalleska, N.F.3    Fisher, E.R.4
  • 23
    • 33746216153 scopus 로고    scopus 로고
    • 2 surface production during fluorocarbon plasma processing of silicon
    • 2 surface production during fluorocarbon plasma processing of silicon. J. Appl. Phys. 100:013301
    • (2006) J. Appl. Phys. , vol.100 , pp. 013301
    • Martin, I.T.1    Zhou, J.2    Fisher, E.R.3
  • 24
    • 0142027004 scopus 로고    scopus 로고
    • Mechanisms for deposition and etching in fluorosilane plasma processing
    • Williams KL, Fisher ER. 2003. Mechanisms for deposition and etching in fluorosilane plasma processing. J. Vac. Sci. Technol. A 21:1688-1701
    • (2003) J. Vac. Sci. Technol. A , vol.21 , pp. 1688-1701
    • Williams, K.L.1    Fisher, E.R.2
  • 25
    • 0000376867 scopus 로고    scopus 로고
    • On the importance of ions and ion-molecule reactions to plasma-surface interface reactions
    • Williams KL, Martin IT, Fisher ER. 2002. On the importance of ions and ion-molecule reactions to plasma-surface interface reactions. J. Am. Soc. Mass. Spectrom. 13:518-529
    • (2002) J. Am. Soc. Mass. Spectrom. , vol.13 , pp. 518-529
    • Williams, K.L.1    Martin, I.T.2    Fisher, E.R.3
  • 26
    • 33749043458 scopus 로고    scopus 로고
    • 2 surface reactivity during hot filament and plasma-enhanced chemical vapor deposition of fluorocarbon films
    • 2 surface reactivity during hot filament and plasma-enhanced chemical vapor deposition of fluorocarbon films. Chem. Phys. Lett. 430:113-116
    • (2006) Chem. Phys. Lett. , vol.430 , pp. 113-116
    • Liu, D.1    Martin, I.T.2    Fisher, E.R.3
  • 29
    • 0034536080 scopus 로고    scopus 로고
    • Cavity ring-down spectroscopy: Experimental schemes and applications
    • Berden G, Peeters R, Meijer G. 2000. Cavity ring-down spectroscopy: experimental schemes and applications. Internat. Rev. Phys. Chem. 19:565-607
    • (2000) Internat. Rev. Phys. Chem. , vol.19 , pp. 565-607
    • Berden, G.1    Peeters, R.2    Meijer, G.3
  • 30
    • 0001666727 scopus 로고    scopus 로고
    • Ultraviolet cavity ring-down spectroscopy of free radicals in etching plasmas
    • Booth JP, Cunge G, Biennier L, Romanini D, Kachanov A. 2000. Ultraviolet cavity ring-down spectroscopy of free radicals in etching plasmas. Chem. Phys. Lett. 317:631-636
    • (2000) Chem. Phys. Lett. , vol.317 , pp. 631-636
    • Booth, J.P.1    Cunge, G.2    Biennier, L.3    Romanini, D.4    Kachanov, A.5
  • 34
    • 79957957897 scopus 로고    scopus 로고
    • Temporally resolved cavity ring-down spectroscopy in a pulsed nitrogen plasma
    • Yalin AP, Zare RN, Laux CO, Kruger CH. 2002. Temporally resolved cavity ring-down spectroscopy in a pulsed nitrogen plasma. Appl. Phys. Lett. 81:1408-1410
    • (2002) Appl. Phys. Lett. , vol.81 , pp. 1408-1410
    • Yalin, A.P.1    Zare, R.N.2    Laux, C.O.3    Kruger, C.H.4
  • 35
    • 0035471375 scopus 로고    scopus 로고
    • Validation of current density measurements with a B-dot probe
    • DOI 10.1063/1.1400146
    • Piejak R, Godyak V, Alexandrovich B. 2001. Validation of current density measurements with a B-dot probe. Rev. Sci. Instrum. 72:4002-4004 (Pubitemid 33607406)
    • (2001) Review of Scientific Instruments , vol.72 , Issue.10 , pp. 4002-4004
    • Piejak, R.1    Godyak, V.2    Alexandrovich, B.3
  • 36
    • 0030283060 scopus 로고    scopus 로고
    • The accuracy of Langmuir probe ion density measurements in low-frequency RF discharges
    • Tuszewski M,Tobin JA. 1996. The accuracy of Langmuir probe ion density measurements in low-frequency RF discharges. Plasma Sources Sci. Technol. 5:640-647
    • (1996) Plasma Sources Sci. Technol. , vol.5 , pp. 640-647
    • Tuszewski, M.1    Tobin, J.A.2
  • 40
    • 75249106423 scopus 로고    scopus 로고
    • Mass spectrometric characterization of plasma etching processes
    • ed. RJ Shul, SJ Pearton. Berlin: Springer-Verlag
    • Eddy CR Jr. 2000. Mass spectrometric characterization of plasma etching processes. In Handbook of Advanced Plasma Processing Techniques, ed. RJ Shul, SJ Pearton. Berlin: Springer-Verlag
    • (2000) Handbook of Advanced Plasma Processing Techniques
    • Eddy Jr., C.R.1
  • 41
    • 0033469422 scopus 로고    scopus 로고
    • Mass spectrometric detection of reactive neutral species: Beam-to-background ratio
    • Singh H, Coburn JW, Graves DB. 1999. Mass spectrometric detection of reactive neutral species: Beam-to-background ratio. J.Vac. Sci.Technol.A17:2447- 2455
    • (1999) J.Vac. Sci.Technol.A17 , pp. 2447-2455
    • Singh, H.1    Coburn, J.W.2    Graves, D.B.3
  • 42
    • 1242352014 scopus 로고    scopus 로고
    • Measurement of absolute radical densities in a plasma using modulated-beam line-of-sight threshold ionization mass spectrometry
    • Agarwal S, Quax GWW, van de Sanden MCM, Maroudas D, Aydil ES. 2004. Measurement of absolute radical densities in a plasma using modulated-beam line-of-sight threshold ionization mass spectrometry. J. Vac. Sci. Technol. A 22:71-81
    • (2004) J. Vac. Sci. Technol. A , vol.22 , pp. 71-81
    • Agarwal, S.1    Quax, G.W.W.2    Van De Sanden, M.C.M.3    Maroudas, D.4    Aydil, E.S.5
  • 45
    • 34248574151 scopus 로고    scopus 로고
    • Cryotrapping assisted mass spectrometry for the analysis of complex gas mixtures
    • Ferreira JA, Tabares FL. 2007. Cryotrapping assisted mass spectrometry for the analysis of complex gas mixtures. J. Vac. Sci. Technol. A 25:246-251
    • (2007) J. Vac. Sci. Technol. A , vol.25 , pp. 246-251
    • Ferreira, J.A.1    Tabares, F.L.2
  • 48
    • 1842477085 scopus 로고    scopus 로고
    • Fourier transform infrared phasemodulated ellipsometry for in situ diagnostics of plasma-surface interactions
    • Shirafuji T, Motomura H,Tachibana K. 2004. Fourier transform infrared phasemodulated ellipsometry for in situ diagnostics of plasma-surface interactions. J. Phys. D: Appl. Phys. 37:R49-R73
    • (2004) J. Phys. D: Appl. Phys. , vol.37
    • Shirafuji, T.1    Motomura, H.2    Tachibana, K.3
  • 49
    • 33847700965 scopus 로고    scopus 로고
    • Second harmonic generation spectroscopy as a method for in situ and online characterization of particle surface properties
    • Schneider L, Peukert W. 2007. Second harmonic generation spectroscopy as a method for in situ and online characterization of particle surface properties. Part. Part. Sys. Charact. 23:351-359
    • (2007) Part. Part. Sys. Charact. , vol.23 , pp. 351-359
    • Schneider, L.1    Peukert, W.2
  • 50
    • 0034833161 scopus 로고    scopus 로고
    • New tools for surface second-harmonic generation
    • Simpson GJ. 2001. New tools for surface second-harmonic generation. Appl. Spectrosc. 55:16A-32A
    • (2001) Appl. Spectrosc. , vol.55
    • Simpson, G.J.1
  • 51
    • 10044224752 scopus 로고    scopus 로고
    • Spectroscopic second harmonic generation measured on plasma-deposited hydrogenated amorphous silicon thin films
    • KesselsWMM,Gielis JJH, Aarts IMP, Leewis CM, van de SandenMCM.2004. Spectroscopic second harmonic generation measured on plasma-deposited hydrogenated amorphous silicon thin films. Appl. Phys. Lett. 85:4049-4051
    • (2004) Appl. Phys. Lett. , vol.85 , pp. 4049-4051
    • Kessels, W.M.M.1    Gielis, J.J.H.2    Aarts, I.M.P.3    Leewis, C.M.4    Van De Sanden, M.C.M.5
  • 52
    • 33244461752 scopus 로고    scopus 로고
    • Probing hydrogenated amorphous silicon surface states by spectroscopic and real-time second-harmonic generation
    • Aarts IMP, Gielis JJH, van de Sanden MCM, Kessels WMM. 2006. Probing hydrogenated amorphous silicon surface states by spectroscopic and real-time second-harmonic generation. Phys. Rev. B: Condens. Matter 73:045327
    • (2006) Phys. Rev. B: Condens. Matter , vol.73 , pp. 045327
    • Aarts, I.M.P.1    Gielis, J.J.H.2    Van De Sanden, M.C.M.3    Kessels, W.M.M.4
  • 56
    • 0001161417 scopus 로고
    • The decomposition of polytetrafluoroethylene in a glow discharge
    • Mathias E, Miller GH. 1965. The decomposition of polytetrafluoroethylene in a glow discharge. J. Phys. Chem. 71:2671-2675
    • (1965) J. Phys. Chem. , vol.71 , pp. 2671-2675
    • Mathias, E.1    Miller, G.H.2
  • 57
    • 0026743719 scopus 로고
    • Surface science aspects of etching reactions
    • Winters HF, Coburn JW. 1992. Surface science aspects of etching reactions. Surf. Sci. Rep. 14:161-269
    • (1992) Surf. Sci. Rep. , vol.14 , pp. 161-269
    • Winters, H.F.1    Coburn, J.W.2
  • 58
    • 0020902887 scopus 로고
    • Plasma-assisted etching in microfabrication
    • Coburn JW, Winters HF. 1983. Plasma-assisted etching in microfabrication. Ann. Rev. Mater. Sci. 13:91-116
    • (1983) Ann. Rev. Mater. Sci. , vol.13 , pp. 91-116
    • Coburn, J.W.1    Winters, H.F.2
  • 60
    • 0037198346 scopus 로고    scopus 로고
    • Surface chemistry associated with plasma etching processes
    • Graves DB, Humbird D. 2002. Surface chemistry associated with plasma etching processes. Appl. Surf. Sci. 192:72-87
    • (2002) Appl. Surf. Sci. , vol.192 , pp. 72-87
    • Graves, D.B.1    Humbird, D.2
  • 61
    • 0001720164 scopus 로고    scopus 로고
    • Surface kinetics and plasma equipment model for Si etching by fluorocarbon plasmas
    • Zhang D, Kushner MJ. 2000. Surface kinetics and plasma equipment model for Si etching by fluorocarbon plasmas. J. Appl. Phys. 87:1060-1069
    • (2000) J. Appl. Phys. , vol.87 , pp. 1060-1069
    • Zhang, D.1    Kushner, M.J.2
  • 64
    • 0032137652 scopus 로고    scopus 로고
    • Absolute radical densities in etching plasmas determined by broad-band UV absorption spectroscopy
    • Booth JP, Cunge G, Neuilly F, Sadeghi N. 1998. Absolute radical densities in etching plasmas determined by broad-band UV absorption spectroscopy. Plasma Sources Sci. Technol. 7:423-430
    • (1998) Plasma Sources Sci. Technol. , vol.7 , pp. 423-430
    • Booth, J.P.1    Cunge, G.2    Neuilly, F.3    Sadeghi, N.4
  • 69
    • 0036494410 scopus 로고    scopus 로고
    • Determination of electron temperature, atomic fluorine concentration, and gas temperature in inductively coupled fluorocarbon/rare gas plasmas using optical emission spectroscopy
    • Schabel MJ, Donnelly VM, Kornblit A, Tai WW. 2002. Determination of electron temperature, atomic fluorine concentration, and gas temperature in inductively coupled fluorocarbon/rare gas plasmas using optical emission spectroscopy. J. Vac. Sci. Technol. A 20:555-563
    • (2002) J. Vac. Sci. Technol. A , vol.20 , pp. 555-563
    • Schabel, M.J.1    Donnelly, V.M.2    Kornblit, A.3    Tai, W.W.4
  • 70
    • 34547879334 scopus 로고    scopus 로고
    • Temperature and density of CF radicals in 60 MHz capacitively coupled fluorocarbon gas plasma
    • Nagai M, Hori M. 2007. Temperature and density of CF radicals in 60 MHz capacitively coupled fluorocarbon gas plasma. Jpn. J. Appl. Phys., Part 1 46:1176-1180
    • (2007) Jpn. J. Appl. Phys., Part , vol.1 , Issue.46 , pp. 1176-1180
    • Nagai, M.1    Hori, M.2
  • 71
    • 3142747648 scopus 로고    scopus 로고
    • A technique for temperature mapping in fluorocarbon plasmas using planar laser-induced fluorescence of CF
    • Steffens KL, Sobolewski MA. 2004. A technique for temperature mapping in fluorocarbon plasmas using planar laser-induced fluorescence of CF. J. Appl. Phys. 96:71-81
    • (2004) J. Appl. Phys. , vol.96 , pp. 71-81
    • Steffens, K.L.1    Sobolewski, M.A.2
  • 72
    • 0000880796 scopus 로고    scopus 로고
    • 3 containing inductively coupled discharges
    • 3 containing inductively coupled discharges. J. Appl. Phys. 87:7660-7666
    • (2000) J. Appl. Phys. , vol.87 , pp. 7660-7666
    • Hebner, G.A.1    Miller, P.A.2
  • 73
    • 0031361691 scopus 로고    scopus 로고
    • Kinetics of fluorine atoms in high-density carbon tetrafluoride plasmas
    • Sasaki K, Kawai Y, Suzuki C, Kadota K. 1997. Kinetics of fluorine atoms in high-density carbon tetrafluoride plasmas. J. Appl. Phys. 82:5938-5943
    • (1997) J. Appl. Phys. , vol.82 , pp. 5938-5943
    • Sasaki, K.1    Kawai, Y.2    Suzuki, C.3    Kadota, K.4
  • 74
    • 65949114631 scopus 로고
    • Diagnostics and control of radicals in an inductively coupled etching reactor
    • Sugai H, Nakamura K, Hikosaka Y, Nakamura M. 1995. Diagnostics and control of radicals in an inductively coupled etching reactor. J. Vac. Sci. Technol. A 13:887-893
    • (1995) J. Vac. Sci. Technol. A , vol.13 , pp. 887-893
    • Sugai, H.1    Nakamura, K.2    Hikosaka, Y.3    Nakamura, M.4
  • 75
    • 31044436005 scopus 로고    scopus 로고
    • Effect of surface temperature on plasma-surface interactions in an inductively coupled modified gaseous electronics conference reactor
    • Zhou B, Joseph EA, Sant SP, Liu Y, Radhakrishnan A, et al. 2005. Effect of surface temperature on plasma-surface interactions in an inductively coupled modified gaseous electronics conference reactor. J. Vac. Sci. Technol. A 23:1657-1667
    • (2005) J. Vac. Sci. Technol. A , vol.23 , pp. 1657-1667
    • Zhou, B.1    Joseph, E.A.2    Sant, S.P.3    Liu, Y.4    Radhakrishnan, A.5
  • 78
    • 33846810081 scopus 로고    scopus 로고
    • Surface characterization of plasma deposited nano-structured fluorocarbon coatings for promoting in vitro cell growth
    • Senesi GS, Aloia ED, Gristina R, Favia P, d'Agostino R. 2007. Surface characterization of plasma deposited nano-structured fluorocarbon coatings for promoting in vitro cell growth. Surf. Sci. 601:1019-1025
    • (2007) Surf. Sci. , vol.601 , pp. 1019-1025
    • Senesi, G.S.1    Aloia, E.D.2    Gristina, R.3    Favia, P.4    D'Agostino, R.5
  • 79
    • 34248366587 scopus 로고    scopus 로고
    • Insights into sticking of radicals on surface for smart plasma nano-processing
    • Hori M, Goto T. 2007. Insights into sticking of radicals on surface for smart plasma nano-processing. Appl. Surf. Sci. 253:6657-6671
    • (2007) Appl. Surf. Sci. , vol.253 , pp. 6657-6671
    • Hori, M.1    Goto, T.2
  • 80
    • 0001620883 scopus 로고    scopus 로고
    • 2 production and loss mechanisms in fluorocarbon discharges: Fluorine-poor conditions and polymerization
    • 2 production and loss mechanisms in fluorocarbon discharges: fluorine-poor conditions and polymerization. J. Appl. Phys. 85:3952-3959
    • (1999) J. Appl. Phys. , vol.85 , pp. 3952-3959
    • Cunge, G.1    Booth, J.P.2
  • 85
    • 0001072972 scopus 로고    scopus 로고
    • Time resolved UV absorption spectroscopy of pulsed fluorocarbon plasmas
    • Cruden BA, Gleason KK, Sawin HH. 2001. Time resolved UV absorption spectroscopy of pulsed fluorocarbon plasmas. J. Appl. Phys. 89:915-922
    • (2001) J. Appl. Phys. , vol.89 , pp. 915-922
    • Cruden, B.A.1    Gleason, K.K.2    Sawin, H.H.3
  • 86
    • 33745584389 scopus 로고    scopus 로고
    • A review of plasma-surface interactions during processing of polymeric materials measured using the IRIS technique
    • Fisher ER. 2004. A review of plasma-surface interactions during processing of polymeric materials measured using the IRIS technique. Plasma Process. Polym. 1:13-27
    • (2004) Plasma Process. Polym. , vol.1 , pp. 13-27
    • Fisher, E.R.1
  • 87
    • 0000598938 scopus 로고
    • Plasma-surface interactions in fluorocarbon etching of silicon dioxide
    • Butterbaugh JW, Grey DC, Sawin HH. 1991. Plasma-surface interactions in fluorocarbon etching of silicon dioxide. J. Vac. Sci. Technol. B 9:1461-1470
    • (1991) J. Vac. Sci. Technol. B , vol.9 , pp. 1461-1470
    • Butterbaugh, J.W.1    Grey, D.C.2    Sawin, H.H.3
  • 88
    • 0000464708 scopus 로고
    • Quantification of surface film formation effects in fluorocarbon plasma etching of polysilicon
    • Gray DC, Sawin HH, Butterbaugh JW. 1991. Quantification of surface film formation effects in fluorocarbon plasma etching of polysilicon. J. Vac. Sci. Technol. A 9:779-785
    • (1991) J. Vac. Sci. Technol. A , vol.9 , pp. 779-785
    • Gray, D.C.1    Sawin, H.H.2    Butterbaugh, J.W.3
  • 89
    • 0036640186 scopus 로고    scopus 로고
    • Large fluorocarbon ions can contribute to film growth during plasma etching of silicon
    • Fuoco ER, Hanley L. 2002. Large fluorocarbon ions can contribute to film growth during plasma etching of silicon. J. Appl. Phys. 92:37-44
    • (2002) J. Appl. Phys. , vol.92 , pp. 37-44
    • Fuoco, E.R.1    Hanley, L.2
  • 92
    • 0020884613 scopus 로고
    • Laser-induced fluorescence detection of reactive intermediates in diffusion flames and in glow-discharge deposition reactors
    • Lee HU, Deneufville JP, Ovshinsky SR. 1983. Laser-induced fluorescence detection of reactive intermediates in diffusion flames and in glow-discharge deposition reactors. J. Non-Crystal. Solids 59-6:671-674
    • (1983) J. Non-Crystal. Solids , vol.6-59 , pp. 671-674
    • Lee, H.U.1    Deneufville, J.P.2    Ovshinsky, S.R.3
  • 93
    • 0021094945 scopus 로고
    • 4 plasma in an R.F. glow discharge for preparing fluorinated amorphous silicon thin films
    • 4 plasma in an R.F. glow discharge for preparing fluorinated amorphous silicon thin films. Thin Solid Films 109:47-57
    • (1983) Thin Solid Films , vol.109 , pp. 47-57
    • Mutsukura, N.1    Ohuchi, M.2    Satoh, S.3    MacHi, Y.4
  • 94
    • 0000489562 scopus 로고
    • Electronic transition of SiF
    • Martin RW, Merer AJ. 1973. Electronic transition of SiF. Can. J. Phys. 51:634-643
    • (1973) Can. J. Phys. , vol.51 , pp. 634-643
    • Martin, R.W.1    Merer, A.J.2
  • 95
    • 0142057864 scopus 로고
    • The band spectrum of silicon monofluoride, SiF
    • Johns JWC, Barrow RF. 1958. The band spectrum of silicon monofluoride, SiF. Proc. Phys. Soc. Lond. 71:476-484
    • (1958) Proc. Phys. Soc. Lond. , vol.71 , pp. 476-484
    • Johns, J.W.C.1    Barrow, R.F.2
  • 96
    • 0033246897 scopus 로고    scopus 로고
    • Direct spectroscopic evidence of the influence of chamber wall condition on oxide etch rate
    • Lee S,Tien Y-C, Hsu C-F. 1999. Direct spectroscopic evidence of the influence of chamber wall condition on oxide etch rate. Plasma Chem. Plasma Process. 19:285-298 (Pubitemid 129327686)
    • (1999) Plasma Chemistry and Plasma Processing , vol.19 , Issue.2 , pp. 285-298
    • Lee, S.1    Tien, Y.-C.2    Hsu, C.-F.3
  • 97
    • 0037198327 scopus 로고    scopus 로고
    • 2 densities in fluorocarbon containing inductively driven discharges
    • 2 densities in fluorocarbon containing inductively driven discharges. Appl. Surf. Sci. 192:161-175
    • (2002) Appl. Surf. Sci. , vol.192 , pp. 161-175
    • Hebner, G.A.1
  • 99
    • 0029777837 scopus 로고    scopus 로고
    • Monitoring of direct reactions during etching of silicon
    • Giapis KP, Minton TK. 1996. Monitoring of direct reactions during etching of silicon. Mater. Res. Soc. Symp. Proc. 406:33-38
    • (1996) Mater. Res. Soc. Symp. Proc. , vol.406 , pp. 33-38
    • Giapis, K.P.1    Minton, T.K.2
  • 102
    • 13744253789 scopus 로고    scopus 로고
    • Thin-film silicon growth process and solar cell application
    • Matsuda A. 2004. Thin-film silicon growth process and solar cell application. Jpn. J. Appl. Phys., Part 1 43:7909-7920
    • (2004) Jpn. J. Appl. Phys., Part , vol.1 , Issue.43 , pp. 7909-7920
    • Matsuda, A.1
  • 105
    • 0036564750 scopus 로고    scopus 로고
    • In situ probing of surface hydrides on hydrogenated amorphous silicon using attenuated total reflection infrared spectroscopy
    • Kessels WMM, Marra DC, van de Sanden MCM, Aydil ES. 2002. In situ probing of surface hydrides on hydrogenated amorphous silicon using attenuated total reflection infrared spectroscopy. J. Vac. Sci. Technol. A 20:781-789
    • (2002) J. Vac. Sci. Technol. A , vol.20 , pp. 781-789
    • Kessels, W.M.M.1    Marra, D.C.2    Van De Sanden, M.C.M.3    Aydil, E.S.4
  • 106
    • 0032494322 scopus 로고    scopus 로고
    • Spatial rotational temperature and emission intensity profiles in silane plasmas
    • Stamou S, Mataras D, Rapakoulias D. 1998. Spatial rotational temperature and emission intensity profiles in silane plasmas. J. Phys. D: Appl. Phys. 31:2513-2520
    • (1998) J. Phys. D: Appl. Phys. , vol.31 , pp. 2513-2520
    • Stamou, S.1    Mataras, D.2    Rapakoulias, D.3
  • 107
    • 28944453999 scopus 로고    scopus 로고
    • Effects of argon dilution on the translational and rotational temperatures of SiH in silane and disilane plasmas
    • Zhou J, Zhang J, Fisher ER. 2005. Effects of argon dilution on the translational and rotational temperatures of SiH in silane and disilane plasmas. J. Phys. Chem. A 109:10521-10526
    • (2005) J. Phys. Chem. A , vol.109 , pp. 10521-10526
    • Zhou, J.1    Zhang, J.2    Fisher, E.R.3
  • 108
    • 0001461620 scopus 로고    scopus 로고
    • Surface reaction probability during fast deposition of hydrogenated amorphous silicon with a remote silane plasma
    • Kessels WMM, van de Sanden MCM, Severens RJ, Schram DC. 2000. Surface reaction probability during fast deposition of hydrogenated amorphous silicon with a remote silane plasma. J. Appl. Phys. 87:3313-3320
    • (2000) J. Appl. Phys. , vol.87 , pp. 3313-3320
    • Kessels, W.M.M.1    Van De Sanden, M.C.M.2    Severens, R.J.3    Schram, D.C.4
  • 111
    • 34047114928 scopus 로고    scopus 로고
    • Interactions between radical growth precursors on plasma-deposited silicon thin-film surfaces
    • Bakos T, Valipa MS, Maroudas D. 2007. Interactions between radical growth precursors on plasma-deposited silicon thin-film surfaces. J. Chem. Phys. 126:114704
    • (2007) J. Chem. Phys. , vol.126 , pp. 114704
    • Bakos, T.1    Valipa, M.S.2    Maroudas, D.3
  • 112
    • 34547295968 scopus 로고    scopus 로고
    • First-principles theoretical analysis of sequential hydride dissociation on surfaces of silicon thin films
    • Singh T, Valipa MS, Mountziaris TJ, Maroudas D. 2007. First-principles theoretical analysis of sequential hydride dissociation on surfaces of silicon thin films. Appl. Phys. Lett. 90:251915
    • (2007) Appl. Phys. Lett. , vol.90 , pp. 251915
    • Singh, T.1    Valipa, M.S.2    Mountziaris, T.J.3    Maroudas, D.4
  • 113
    • 0034227696 scopus 로고    scopus 로고
    • Abstraction of hydrogen by Si radicals from hydrogenated amorphous silicon wafers
    • Sriraman S, Ramalingam S, Aydil ES, Maroudas D. 2000. Abstraction of hydrogen by Si radicals from hydrogenated amorphous silicon wafers. Surf. Sci. 459:L475-81
    • (2000) Surf. Sci. , vol.459
    • Sriraman, S.1    Ramalingam, S.2    Aydil, E.S.3    Maroudas, D.4
  • 116
    • 33847761451 scopus 로고    scopus 로고
    • Correlation of gas-phase composition with film properties in the plasma-enhanced chemical vapor deposition of hydrogenated amorphous carbon nitride films
    • Liu D, Zhou J, Fisher ER. 2007. Correlation of gas-phase composition with film properties in the plasma-enhanced chemical vapor deposition of hydrogenated amorphous carbon nitride films. J. Appl. Phys. 101:023304
    • (2007) J. Appl. Phys. , vol.101 , pp. 023304
    • Liu, D.1    Zhou, J.2    Fisher, E.R.3
  • 117
    • 33751285405 scopus 로고    scopus 로고
    • Surface reactivity and energetics of CH radicals during plasma deposition of hydrogenated diamond-like carbon films
    • Zhou J, Fisher ER. 2006. Surface reactivity and energetics of CH radicals during plasma deposition of hydrogenated diamond-like carbon films. J. Phys. Chem. B 110:21911-21919
    • (2006) J. Phys. Chem. B , vol.110 , pp. 21911-21919
    • Zhou, J.1    Fisher, E.R.2
  • 121
    • 0001344845 scopus 로고    scopus 로고
    • Simultaneous interaction of methyl radicals and atomic hydrogen with amorphous hydrogenated carbon films
    • von Keudell A, Schwarz-Selinger T, Jacob W. 2001. Simultaneous interaction of methyl radicals and atomic hydrogen with amorphous hydrogenated carbon films. J. Appl. Phys. 89:2979-2986
    • (2001) J. Appl. Phys. , vol.89 , pp. 2979-2986
    • Von Keudell, A.1    Schwarz-Selinger, T.2    Jacob, W.3
  • 122
    • 0034966546 scopus 로고    scopus 로고
    • Simultaneous interaction of methyl radicals and atomic hydrogen with amorphous hydrogenated carbon films, as investigated with optical in situ diagnostics
    • von Keudell A, Meier M, Schwarz-Selinger T. 2001. Simultaneous interaction of methyl radicals and atomic hydrogen with amorphous hydrogenated carbon films, as investigated with optical in situ diagnostics. Appl. Phys. A 72:551-556
    • (2001) Appl. Phys. A , vol.72 , pp. 551-556
    • Von Keudell, A.1    Meier, M.2    Schwarz-Selinger, T.3
  • 123
    • 84957256575 scopus 로고
    • Appearance mass spectrometry of neutral radicals in radio frequency plasmas
    • Sugai H, Toyoda H. 1992. Appearance mass spectrometry of neutral radicals in radio frequency plasmas. J. Vac. Sci. Technol. A 10:1193-1200
    • (1992) J. Vac. Sci. Technol. A , vol.10 , pp. 1193-1200
    • Sugai, H.1    Toyoda, H.2
  • 125
    • 0000410189 scopus 로고    scopus 로고
    • 3 detection in a low-density supersonic arcjet plasma during diamond synthesis
    • 3 detection in a low-density supersonic arcjet plasma during diamond synthesis. Appl. Phys. Lett. 70:1052-1054
    • (1997) Appl. Phys. Lett. , vol.70 , pp. 1052-1054
    • Loh, M.H.1    Capelli, M.A.2
  • 126
    • 36048939416 scopus 로고    scopus 로고
    • 3 radicals during the deposition of fluorocarbon and hydrocarbon films
    • 3 radicals during the deposition of fluorocarbon and hydrocarbon films. J. Vac. Sci. Technol. A 25:1519-1523
    • (2007) J. Vac. Sci. Technol. A , vol.25 , pp. 1519-1523
    • Liu, D.1    Fisher, E.R.2
  • 127
    • 0037182083 scopus 로고    scopus 로고
    • Plasma plume characteristics of supersonic ammonia and nitrogen/hydrogen-mixture DC plasma jets for nitriding under low-pressure environment
    • Tahara H, Ando Y, Onoe K, Yoshikawa T. 2002. Plasma plume characteristics of supersonic ammonia and nitrogen/hydrogen-mixture DC plasma jets for nitriding under low-pressure environment. Vacuum 65:311-318
    • (2002) Vacuum , vol.65 , pp. 311-318
    • Tahara, H.1    Ando, Y.2    Onoe, K.3    Yoshikawa, T.4
  • 131
    • 0030388628 scopus 로고    scopus 로고
    • Photoelectron spectroscopy study of amorphous silicon-carbon alloys deposited by plasma-enhanced chemical vapor deposition
    • Cicala G, Bruno G, Capezzuto P, Favia P. 1996. Photoelectron spectroscopy study of amorphous silicon-carbon alloys deposited by plasma-enhanced chemical vapor deposition. J. Mater. Res. 11:3017-3023
    • (1996) J. Mater. Res. , vol.11 , pp. 3017-3023
    • Cicala, G.1    Bruno, G.2    Capezzuto, P.3    Favia, P.4
  • 135
    • 33745713620 scopus 로고    scopus 로고
    • Radical surface interactions during film deposition: A sticky situation?
    • Liu D, Martin IT, Zhou J, Fisher ER. 2006. Radical surface interactions during film deposition: a sticky situation? Pure Appl. Chem. 78:1187-1202
    • (2006) Pure Appl. Chem. , vol.78 , pp. 1187-1202
    • Liu, D.1    Martin, I.T.2    Zhou, J.3    Fisher, E.R.4
  • 136
    • 34249012144 scopus 로고    scopus 로고
    • Optical emission spectroscopy diagnostics of inductively-driven plasmas in argon gas at low pressures
    • Iordanova S, Koleva I. 2007. Optical emission spectroscopy diagnostics of inductively-driven plasmas in argon gas at low pressures. Spectrochim. Acta B 62:344-356
    • (2007) Spectrochim. Acta B , vol.62 , pp. 344-356
    • Iordanova, S.1    Koleva, I.2
  • 137
    • 20744445373 scopus 로고    scopus 로고
    • Plasma chemistry ofNOin complex gas mixtures excited with a surfatron launcher
    • Hueso JL, Gonzalez-Flipe AR, Cotrino J, Caballero A. 2005. Plasma chemistry ofNOin complex gas mixtures excited with a surfatron launcher. J. Phys. Chem. A 109:4930-4938
    • (2005) J. Phys. Chem. A , vol.109 , pp. 4930-4938
    • Hueso, J.L.1    Gonzalez-Flipe, A.R.2    Cotrino, J.3    Caballero, A.4
  • 139
    • 0342600033 scopus 로고    scopus 로고
    • 3, and CH radicals by laser-induced fluorescence in a diamond depositing dc-arcjet
    • 3, and CH radicals by laser-induced fluorescence in a diamond depositing dc-arcjet. J. Appl. Phys. 82:2072-2081
    • (1997) J. Appl. Phys. , vol.82 , pp. 2072-2081
    • Luque, J.1    Juchmann, W.2    Jeffries, J.B.3
  • 140
    • 1642536383 scopus 로고    scopus 로고
    • +) radicals produced by the dissociative excitation reaction of BrCN with the microwave discharge flow of Ar
    • +) radicals produced by the dissociative excitation reaction of BrCN with the microwave discharge flow of Ar. Jpn. J. Appl. Phys., Part 1 42:7116-7121
    • (2003) Jpn. J. Appl. Phys. , vol.42 , Issue.PART 1 , pp. 7116-7121
    • Ito, H.1    Ichimura, S.Y.2    Namiki, K.C.3    Saitoh, H.4
  • 141
    • 4444358398 scopus 로고    scopus 로고
    • Determination of fluorine in copper by radio-frequency-powered glow-discharge plasma source emission spectroscopy associated with laser ablation sampling
    • Ushirozawa Y, Matsuda H, Wagatsuma K. 2004. Determination of fluorine in copper by radio-frequency-powered glow-discharge plasma source emission spectroscopy associated with laser ablation sampling. Jpn. Soc. Anal. Chem. 53:699-703
    • (2004) Jpn. Soc. Anal. Chem. , vol.53 , pp. 699-703
    • Ushirozawa, Y.1    Matsuda, H.2    Wagatsuma, K.3
  • 143
  • 144
    • 75249091034 scopus 로고    scopus 로고
    • 2 surface reactivities during plasma enhanced chemical vapor deposition of fluorocarbon films
    • Work. Pap., Dep. Chem., Colo. State Univ.
    • 2 surface reactivities during plasma enhanced chemical vapor deposition of fluorocarbon films.Work. Pap., Dep. Chem., Colo. State Univ.
    • (2008) J. Appl. Phys.
    • Liu, D.1    Martin, I.T.2    Fisher, E.R.3
  • 146
    • 0028760821 scopus 로고
    • Effects of C incorporation on the luminescence properties of the ZnSe grown by metalorganic chemical vapor deposition
    • Skromme BJ, Liu W, Jensen KF, Giapis KP. 1994. Effects of C incorporation on the luminescence properties of the ZnSe grown by metalorganic chemical vapor deposition. J. Cryst. Growth 138:338-345
    • (1994) J. Cryst. Growth , vol.138 , pp. 338-345
    • Skromme, B.J.1    Liu, W.2    Jensen, K.F.3    Giapis, K.P.4
  • 147
    • 23944525856 scopus 로고    scopus 로고
    • Laser-induced fluorescence (LIF) probe for in-situ nitric oxide concentration measurement in a nonthermal pulsed corona discharge plasma reactor
    • Hu X, Zhao G-B, Janardhan Garikipati SVB, Nicholas K, Legowski SF, Radosz S. 2005. Laser-induced fluorescence (LIF) probe for in-situ nitric oxide concentration measurement in a nonthermal pulsed corona discharge plasma reactor. Plasma Chem. Plasma Process. 25:351-370
    • (2005) Plasma Chem. Plasma Process. , vol.25 , pp. 351-370
    • Hu, X.1    Zhao, G.-B.2    Garikipati Svb, J.3    Nicholas, K.4    Legowski, S.F.5    Radosz, S.6
  • 151
    • 0012335706 scopus 로고
    • Laser-induced-fluorescence detection of sulfur monoxide and sulfur dioxide in sulfur hexafluoride/oxygen plasma-etching discharges
    • Greenberg KE, Hargis PJ Jr. 1990. Laser-induced-fluorescence detection of sulfur monoxide and sulfur dioxide in sulfur hexafluoride/oxygen plasma-etching discharges. J. Appl. Phys. 68:505-511
    • (1990) J. Appl. Phys. , vol.68 , pp. 505-511
    • Greenberg, K.E.1    Hargis Jr., P.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.