Time-resolved cavity ring-down spectroscopic study of the gas phase and surface loss rates of Si and SiH3 plasma radicals

Chemical Physics Letters

Volumn 360, Issue 1-2, 2002, Pages 189-193

  Hoefnagels, J P M ^a   Stevens, A A E ^a   Boogaarts, M G H ^a   Kessels, W M M ^a   Van De Sanden, M C M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

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Indexed keywords

EID: 0037014756     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0009-2614(02)00802-3     Document Type: Article

References (17)