-
1
-
-
0029353044
-
-
B. M. Penetrante, M. C. Hsiao, B. T. Merritt, G. E. Vogtlin, and P. H. Wallman, IEEE Trans. Plasma Sci. 23, 679 (1995).
-
(1995)
IEEE Trans. Plasma Sci.
, vol.23
, pp. 679
-
-
Penetrante, B.M.1
Hsiao, M.C.2
Merritt, B.T.3
Vogtlin, G.E.4
Wallman, P.H.5
-
6
-
-
0000221966
-
-
C. Schulz, V. Sick, U. E. Meier, J. Heinze, and W. Stricker, Appl. Opt. 38, 1434 (1999).
-
(1999)
Appl. Opt.
, vol.38
, pp. 1434
-
-
Schulz, C.1
Sick, V.2
Meier, U.E.3
Heinze, J.4
Stricker, W.5
-
10
-
-
0033690975
-
-
F. Fresnet, G. Baravian, S. Pasquiers, C. Postel, V. Puech, A. Rousseau, and M. Rozoy, J. Phys. D: Appl. Phys. 33, 1315 (2000).
-
(2000)
J. Phys. D: Appl. Phys.
, vol.33
, pp. 1315
-
-
Fresnet, F.1
Baravian, G.2
Pasquiers, S.3
Postel, C.4
Puech, V.5
Rousseau, A.6
Rozoy, M.7
-
11
-
-
0035509765
-
-
S. Kanazawa, T. Ito, Y. Shuto, T. Ohkubo, Y. Nomoto, and J. Mizeraczyk, IEEE Trans. Ind. Appl. 37, 1663 (2001).
-
(2001)
IEEE Trans. Ind. Appl.
, vol.37
, pp. 1663
-
-
Kanazawa, S.1
Ito, T.2
Shuto, Y.3
Ohkubo, T.4
Nomoto, Y.5
Mizeraczyk, J.6
-
12
-
-
0036028895
-
-
T. Ohkubo, S. Kanasawa, Y. Shuto, Y. Nomato, and J. Mizeraczyk, Proc. SPIE 4460, 318 (2002).
-
(2002)
Proc. SPIE
, vol.4460
, pp. 318
-
-
Ohkubo, T.1
Kanasawa, S.2
Shuto, Y.3
Nomato, Y.4
Mizeraczyk, J.5
-
13
-
-
0032940246
-
-
G. Sathiamoorthy, S. Kalyana, W. C. Finney, R. J. Clark, and B. R. Locke, Ind. Eng. Chem. Res. 38, 1844 (1999).
-
(1999)
Ind. Eng. Chem. Res.
, vol.38
, pp. 1844
-
-
Sathiamoorthy, G.1
Kalyana, S.2
Finney, W.C.3
Clark, R.J.4
Locke, B.R.5
-
14
-
-
0036642536
-
-
X. Hu, J. Nicholas, J. Zhang, T. M Linjewile, P. de Filippis, and P. K. Agarwal, Fuel. 81, 1259 (2002).
-
(2002)
Fuel.
, vol.81
, pp. 1259
-
-
Hu, X.1
Nicholas, J.2
Zhang, J.3
Linjewile, T.M.4
De Filippis, P.5
Agarwal, P.K.6
-
15
-
-
2442428275
-
-
G. Zhao, X. Hu, M. Yeung, and M. Radosz, Ind. Eng. Chem. Res. 43(10), 2315 (2004).
-
(2004)
Ind. Eng. Chem. Res.
, vol.43
, Issue.10
, pp. 2315
-
-
Zhao, G.1
Hu, X.2
Yeung, M.3
Radosz, M.4
-
16
-
-
8344281421
-
-
X. Hu, G. Zhao, J. Zhang, L. Wang, and M. Radosz, Ind. Eng. Chem. Res. 43, 7456 (2004).
-
(2004)
Ind. Eng. Chem. Res.
, vol.43
, pp. 7456
-
-
Hu, X.1
Zhao, G.2
Zhang, J.3
Wang, L.4
Radosz, M.5
-
18
-
-
0027557937
-
-
M. G. Allen, T. E. Parker, W. G. Reinecke, H. H. Legner, and R. R. Foutter, AIAA J. 31, 505 (1993).
-
(1993)
AIAA J.
, vol.31
, pp. 505
-
-
Allen, M.G.1
Parker, T.E.2
Reinecke, W.G.3
Legner, H.H.4
Foutter, R.R.5
-
20
-
-
84951890711
-
-
R. Atkinson, D. L. Baulch, R. A. Cox, J. R. F. Hampson, J. A. Kerr, and J. Troe, J. Phys. Chem. Ref. Data 18(2), 881 (1989).
-
(1989)
J. Phys. Chem. Ref. Data
, vol.18
, Issue.2
, pp. 881
-
-
Atkinson, R.1
Baulch, D.L.2
Cox, R.A.3
Hampson, J.R.F.4
Kerr, J.A.5
Troe, J.6
-
21
-
-
0031317005
-
-
R. Atkinson, D. L. Baulch, R. A. Cox, J. R. F. Hampson, J. A Kerr, and J. Troe, J. Phys. Chem. Ref. Data 26, 1329 (1997).
-
(1997)
J. Phys. Chem. Ref. Data
, vol.26
, pp. 1329
-
-
Atkinson, R.1
Baulch, D.L.2
Cox, R.A.3
Hampson, J.R.F.4
Kerr, J.A.5
Troe, J.6
-
22
-
-
36149029784
-
-
I. A. Kossyi, A. Y. Kostinsky, A. A. Matveyev, and V. P. Silakov, Plasma Sources Sci. Technol. 1, 207 (1992).
-
(1992)
Plasma Sources Sci. Technol.
, vol.1
, pp. 207
-
-
Kossyi, I.A.1
Kostinsky, A.Y.2
Matveyev, A.A.3
Silakov, V.P.4
-
24
-
-
12244285864
-
-
R. J. Shul, L. Upschulte, R. Passarella, R. G. Keesee, and A. W. Castleman, J. Phys. Chem. 91, 2556 (1987).
-
(1987)
J. Phys. Chem.
, vol.91
, pp. 2556
-
-
Shul, R.J.1
Upschulte, L.2
Passarella, R.3
Keesee, R.G.4
Castleman, A.W.5
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