Photoelectron spectroscopy study of amorphous silicon-carbon alloys deposited by plasma-enhanced chemical vapor deposition

Journal of Materials Research

Volumn 11, Issue 12, 1996, Pages 3017-3023

  Cicala, G ^a   Bruno, G ^a   Capezzuto, P ^a   Favia, P ^a  

^a UNIVERSITY OF BARI   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ALLOYING; AMORPHOUS ALLOYS; BAND STRUCTURE; CHEMICAL VAPOR DEPOSITION; ELECTRONS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LIGHT ABSORPTION; METHANE; PHOTOELECTRON SPECTROSCOPY; PLASMAS;

AIR OXIDATION; AMORPHOUS SILICON CARBON ALLOYS; OPTICAL TRANSMISSION SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; VALENCE BAND STRUCTURE;

SILICON ALLOYS;

EID: 0030388628     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1996.0383     Document Type: Article

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