Investigation of inductively coupled Ar and CH4/Ar plasmas and the effect of ion energy on DLC film properties

Plasma Sources Science and Technology

Volumn 15, Issue 4, 2006, Pages 714-726

  Zhou, Jie ^a   Martin, Ina T ^a   Ayers, Reed ^b   Adams, Eli ^a   Liu, Dongping ^a   Fisher, Ellen R ^a  

^a Department of Environmental and Radiological Health Sciences   (United States)

^b Department of Geology and Geological Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; DIAMOND LIKE CARBON FILMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ION BOMBARDMENT; MASS SPECTROMETRY; METHANE; MOLECULAR BEAMS; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS;

ION ENERGY DISTRIBUTIONS (IED); ION-NEUTRAL COLLISIONS; LANGMUIR PROBE; NEGATIVE BIAS VOLTAGE;

INDUCTIVELY COUPLED PLASMA;

EID: 33750603151     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/15/4/016     Document Type: Article

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