Optical diagnostics for plasma-surface interaction in CF4/Ar radio-frequency inductively coupled plasma during Si and SiO2 etching

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 5, 2006, Pages 1718-1724

  Miyoshi, Y ^a   Miyauchi, M ^a   Oguni, A ^a   Makabe, T ^a  

^a KEIO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTERIZED TOMOGRAPHY; DIFFUSION; ELECTRONS; FLUOROCARBONS; POLYMERIZATION; RADIO FREQUENCY AMPLIFIERS; SILICON COMPOUNDS;

GAS PHASE; OPTICAL DIAGNOSTICS; OPTICAL EMISSION SPECTROSCOPY; PLASMA SURFACE INTERACTION;

ETCHING;

EID: 33748579051     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2217978     Document Type: Article

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