First-principles theoretical analysis of sequential hydride dissociation on surfaces of silicon thin films

Applied Physics Letters

Volumn 90, Issue 25, 2007, Pages

  Singh, Tejinder ^a   Valipa, Mayur S ^a   Mountziaris, T J ^a   Maraudas, Dimitrios ^a  

^a University of Massachusetts   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION BARRIERS; REACTION BARRIERS; SURFACE CHEMICAL COMPOSITION;

AMORPHOUS SILICON; DENSITY FUNCTIONAL THEORY; FILM GROWTH; HYDROGENATION; SURFACE STRUCTURE;

THIN FILMS;

EID: 34547295968     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2746945     Document Type: Article

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