Surface reactivity and energetics of CH radicals during plasma deposition of hydrogenated diamondlike carbon films

Journal of Physical Chemistry B

Volumn 110, Issue 43, 2006, Pages 21911-21919

  Zhou, Jie ^a   Fisher, Ellen R ^a  

^a Department of Environmental and Radiological Health Sciences   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CARBON; DIAMONDS; HYDROGEN; PLASMA APPLICATIONS; SUBSTRATES; SURFACE REACTIONS;

DIAMONDLIKE CARBON (DLC); LASER INDUCED FLUORESCENCE (LIF); PLASMA DEPOSITION; PLASMA SPECIES;

THIN FILMS;

EID: 33751285405     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp064125n     Document Type: Article

References (49)

1. Haverkamp, J.; Mayo, R. M.; Bourham, M. A.; Narayan, J.; Jin, C.; Duscher, F. J. Appl. Phys. 2003, 93, 3627.
2. Choi, W. S.; Chung, I.; Lee, Y. Z.; Hong, B. Surf. Coat. Technol. 2004, 180-181, 254.
3. Umehara, Y.; Murai, S.; Koide, Y.; Murakami, M. Diamond Relat. Mater. 2002, 11, 1429.
4. Lung, B. H.; Chiang, M. J.; Hon, M. H. Thin Solid Films 2001, 392, 16.
5. Ueng, H. Y.; Quo, C. T. Appl. Surf. Sci. 2005, 249, 246.
6. Brown, M. S.; Forlines, R. A.; Ganguly, B. N. J. Appl. Phys. 2005, 97, 103302.
7. Tang, W.; Liu, J.; Huang, T.; Lu, F. Diamond Relat. Mater. 2001, 10, 327.
8. Sun, Z.; Xu, S.; Ostrikov, K. N. Diamond Relat. Mater. 2002, 11, 92.
9. Lee, J. J. Surf. Coat. Technol. 2005, 200, 31.
10. Morrison, N. A.; William, C.; Milne, W. I. J. Appl. Phys. 2003, 94, 7031.
11. Yamashita, Y.; Toyoda, H.; Sugai, H. Jpn. J. Appl. Phys. 1989, 28, 1647.
12. Brinkman, E. A.; Raiche, G. A.; Brown, M. S.; Jeffries, J. B. Appl. Phys. B 1997, 64, 689.
13. Hummernbrum, F.; Kempkens, H.; Ruzicka, A.; Sauren, H. D.; Schiffer, C.; Uhlenbuschl, J.; Winter, J. Plasma Sources Sci. Technol. 1992, 1, 221.
14. Tachibana, K.; Mukai, T.; Yuuki, A.; Matsui, Y.; Harima, H. Jpn. J. Appl. Phys. 1990, 29, 2156.
15. Luque, J.; Juchmann, W.; Jeffries, J. B. Appl. Opt. 1997, 36, 3261.
16. Menningen, K. L.; Chids, M. A.; Toyoda, H.; Ueda, Y.; Anderson, L. W.; Lawler, J. E. Contrib. Plasma Phys. 1995, 35, 359.
17. Kaminski, C.; Ewart, P. Appl. Phys. B 1995, 61, 585.
18. Yun, J.; Dandy, D. S. Diamond Relat. Mater. 2005, 14, 1432.
19. Keudell, A. V.; Meier, M.; Schwarz-Selinger, T.; Jacob, W. J. Appl. Phys. 2001, 89, 2979.
20. Thiesemann, H.; MacNamara, J.; Taaties, C. A. J. Phys. Chem. A 1997, 101, 1881.
21. Liu, D.; Martin, I. T.; Zhou, J.; Fisher, E. R. Pure Appl. Chem. 2006, 78, 1187.
22. Fisher, E. R. Plasma Process. Polym. 2004, 1, 13.
23. Zhang, J.; Williams, K. L.; Fisher, E. R. J. Phys. Chem. A 2003, 107, 593.
24. Zhang, J.; Fisher, E. R. J. Phys. Chem. B 2004, 108, 9821.
25. Williams, K. L.; Fisher, E. R. J. Vac. Sci. Technol. A 2003, 21, 1024.
26. Lieberman, M. A.; Lichtenberg, A. J. Principles of Plasma Discharges and Material Processing; Wiley and Sons: New York, 1994.
27. McCurdy, P. R.; Venture, V. A.; Fisher, E. R. Chem. Phys. Lett. 1997, 274, 120.
28. Bogart, K. H. A.; Cushing, J. P.; Fisher, E. R. J. Phys. Chem. B 1997, 101, 10016.
29. Kessels, W. M. M.; McCurdy, P. R.; Williams, K. L.; Barker, G. R.; Venturo, V. A.; Fisher, E. R. J. Phys. Chem. B 2002, 106, 2680.
30. McCurdy, P. R.; Butoi, C. I.; Williams, K. L.; Fisher, E. R. J. Phys. Chem. B 1999, 103, 6919.
31. Butoi, C. I.; Steen, M. L.; Peers, J. R. D.; Fisher, E. R. J. Phys. Chem. B 2001, 105, 5957.
32. Zhou, J.; Zhang, J.; Fisher, E. R. J. Phys. Chem. A 2005, 109, 10521.
33. Becker, K. H.; Brenig, H. H.; Tatarczyk, T. Chem. Phys. Lett. 1980, 71, 242.
34. Zhou, J. Diagnostics of Carbon and Silicon-based Plasmas: From Surface Chemistry to Gas-Phase Physics. Ph.D. Thesis, Colorado State University, Fort Collins, CO, 2006.
35. Luque, J.; Crosley, D. R. LIFBASE: Database and Spectral Simulation, 2.0.54 ed.; SRI International Report MP 99-009; SRI International: Menlo Park, CA, 2005.
36. Ho, P.; Breiland, W. G.; Buss, R. J. J. Chem. Phys. 1989, 91, 2627.
37. Martin, I. T.; Fisher, E. R. J. Vac. Sci. Technol. A 2004, 22, 2168.
38. Steen, M. L.; Kull, K. R.; Fisher, E. R. J. Appl. Phys. 2002, 92, 55.
39. Filippov, A. V.; Mankelevich, Y. A.; Pal, A. F.; Rakhimova, T. V.; Ryabinkin, A. N.; Serov, A. O.; Yuriev, A. Y. Presented at the 17th International Symposium on Plasma Chemistry, Toronto, Canada, 2005.
40. Luque, J.; Crosley, D. R. J. Chem. Phys. 1996, 104, 2146.
41. Grill, A. Cold Plasmas in Materials Fabrication; IEEE Press: Piscataway, NJ, 1994.
42. Yasuda, H. Plasma Polymerization; Academic Press: Orlando, FL, 1985.
43. Keudell, A. V.; Meier, M.; Schwarz-Selinger, T. Appl. Phys. A 2001, 72, 551.
44. Fulle, D.; Hippler, H. J. Chem. Phys. 1997, 106, 8691.
45. NIST Chemical Webbook, http://webbook.nist.gov, 2002.
46. Hertl, M.; Jolly, J. J. Phys. D; Appl. Phys. 2000, 33, 381.
47. Perrin, J. J. Phys. D: Appl. Phys. 1993, 26, 1662.
48. Perrin, J.; Leroy, O.; Bordage, M. C. Contrib. Plasma Phys. 1996, 36, 3.
49. Kessels, W. M. M.; Hoefnagels, J. P. M.; Boogaarts, M. G. H.; Schram, D. C.; Van de Sanden, M. C. M. J. Appl. Phys. 2001, 89, 2065.