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Applied Surface Science

Volumn 192, Issue 1-4, 2002, Pages 72-87

Surface chemistry associated with plasma etching processes

(2) Graves, David B a Humbird, David a

a UNIVERSITY OF CALIFORNIA (United States)

Author keywords

Ion bombardment; Molecular dynamics; Plasma etching; Silicon; Surface chemistry

Indexed keywords

ADSORPTION; COMPUTER SIMULATION; ION BOMBARDMENT; MOLECULAR DYNAMICS; RECRYSTALLIZATION (METALLURGY); SEMICONDUCTING SILICON; SURFACE CHEMISTRY;

ION-INDUCED DAMAGES;

PLASMA ETCHING;

EID: 0037198346 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(02)00021-1 Document Type: Conference Paper

Times cited : (55)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.