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Volumn 430, Issue 1-3, 2006, Pages 113-116
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CF2 surface reactivity during hot filament and plasma-enhanced chemical vapor deposition of fluorocarbon films
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Author keywords
[No Author keywords available]
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Indexed keywords
FILAMENTS (LAMP);
FLUORINE COMPOUNDS;
IMAGING TECHNIQUES;
IONS;
MASS SPECTROMETERS;
NEUTRON SCATTERING;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
REACTION KINETICS;
FILAMENT TEMPERATURE;
FLUOROCARBON FILMS;
HEXAFLUOROPROPYLENE OXIDE (HFPO);
THIN FILMS;
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EID: 33749043458
PISSN: 00092614
EISSN: None
Source Type: Journal
DOI: 10.1016/j.cplett.2006.08.123 Document Type: Article |
Times cited : (13)
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References (21)
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