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Volumn 430, Issue 1-3, 2006, Pages 113-116

CF2 surface reactivity during hot filament and plasma-enhanced chemical vapor deposition of fluorocarbon films

Author keywords

[No Author keywords available]

Indexed keywords

FILAMENTS (LAMP); FLUORINE COMPOUNDS; IMAGING TECHNIQUES; IONS; MASS SPECTROMETERS; NEUTRON SCATTERING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REACTION KINETICS;

EID: 33749043458     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cplett.2006.08.123     Document Type: Article
Times cited : (13)

References (21)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.