Surface reactions during etching of organic low- k films by plasmas of N2 and H2

Journal of Applied Physics

Volumn 99, Issue 8, 2006, Pages

  Ishikawa, Kenji ^a   Yamaoka, Yoshikazu ^b   Nakamura, Moritaka ^b   Yamazaki, Yuichi ^c   Yamasaki, Satoshi ^c   Ishikawa, Yasushi ^a   Samukawa, Seiji ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; INFRARED SPECTROSCOPY; PARAMAGNETIC RESONANCE; PASSIVATION; PLASMAS; SURFACE PROPERTIES;

CARBON DANGLING BONDS; ORGANIC LOW- K FILMS; SURFACE REACTIONS;

THIN FILMS;

EID: 33646720474     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2191567     Document Type: Article

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