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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 3, 2001, Pages 718-729

Measurements of neutral and ion composition, neutral temperature, and electron energy distribution function in a CF4 inductively coupled plasma

(3) Singh, H a Coburn, J W a Graves, D B a

a University of California (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; DISSOCIATION; ELECTRON ENERGY LEVELS; FLUOROCARBONS; ION SOURCES; IONIZATION; PLASMA DENSITY; PRESSURE EFFECTS; RATE CONSTANTS; SECONDARY ION MASS SPECTROMETRY; STATISTICAL METHODS;

ELECTRON ENERGY DISTRIBUTION FUNCTION (EEDF); NEUTRAL TEMPERATURE; SAMPLING APERTURE;

INDUCTIVELY COUPLED PLASMA;

EID: 0035334442 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1354603 Document Type: Article

Times cited : (63)

References (42)

1
- 0026743719
- (1992) Surf. Sci. Rep. , vol.14 , pp. 161
- Winters, H.F.¹ Coburn, J.W.²

2
- 21344499352
- (1994) J. Vac. Sci. Technol. A , vol.12 , pp. 323
- Oehrlein, G.S.¹ Zhang, Y.² Vender, D.³ Haverlag, M.⁴

3
- 0018292486
- (1979) IBM J. Res. Dev. , vol.23 , pp. 33
- Coburn, J.W.¹ Kay, E.²

4
- 0018505687
- (1979) J. Appl. Phys. , vol.50 , pp. 5210
- Coburn, J.W.¹

5
- 0018441483
- (1979) J. Vac. Sci. Technol. , vol.16 , pp. 391
- Coburn, J.W.¹ Winters, H.F.²

6
- 0019021889
- (1980) J. Appl. Phys. , vol.51 , pp. 3134
- Coburn, J.W.¹ Chen, M.²

7
- 0001012541
- (1990) J. Phys. Chem. , vol.94 , pp. 3269
- Hancock, G.¹ Sucksmith, J.² Toogood, M.J.³

8
- 36549096060
- (1986) J. Appl. Phys. , vol.60 , pp. 2775
- Thoman, J.W.¹ Suzuki, K.² Kable, S.H.³ Steinfeld, J.I.⁴

9
- 36549100100
- (1989) J. Appl. Phys. , vol.66 , pp. 5251
- Booth, J.P.¹ Hancock, G.² Perry, N.D.³ Toogood, M.J.⁴

10
- 0000092661
- (1994) J. Appl. Phys. , vol.76 , pp. 5967
- O'Neil, J.A.¹ Singh, J.²

11
- 0027641933
- (1993) Jpn. J. Appl. Phys., Part 2 , vol.32
- Takahashi, K.¹ Hori, M.² Goto, T.³

12
- 0029308672
- (1995) J. Vac. Sci. Technol. B , vol.13 , pp. 954
- Oh, D.B.¹ Stanton, A.C.² Anderson, H.M.³ Splichal, M.P.⁴

13
- 5544316630
- (1995) J. Phys. D , vol.28 , pp. 884
- Maruyama, K.¹ Goto, T.²

14
- 21844510712
- (1994) J. Vac. Sei. Technol. A , vol.12 , pp. 3102
- Haverlag, M.¹ Stoffels, E.² Stoffels, W.W.³ Kroesen, G.M.W.⁴ De Hooog, F.J.⁵

15
- 0033425182
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 2517
- Hayashi, H.¹ Okigawa, M.² Morishita, S.³ Sekine, M.⁴

16
- 36149037318
- (1994) Plasma Sources Sci. Technol. , vol.3 , pp. 460
- Hopwood, J.¹

17
- 0000675908
- (2000) J. Appl. Phys. , vol.87 , pp. 4098
- Singh, H.¹ Graves, D.B.²

18
- 0000166187
- (2000) J. Appl. Phys. , vol.88 , pp. 3889
- Singh, H.¹ Graves, D.B.²

19
- 0033554954
- (1999) J. Appl. Phys. , vol.85 , pp. 703
- Godyak, V.A.¹ Piejak, R.B.² Alexandrovich, B.M.³

20
- 0033469422
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 2447
- Singh, H.¹ Coburn, J.W.² Graves, D.B.³

21
- 0034155705
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 299
- Singh, H.¹ Coburn, J.W.² Graves, D.B.³

22
- 0000802161
- (1990) J. Appl. Phys. , vol.68 , pp. 3157
- Godyak, V.A.¹ Piejak, R.B.²

23
- 0003730831
- Wiley, New York, 1994
- (1994) Principles of Plasma Discharges and Materials Processing
- Lieberman, M.A.¹ Lichtenberg, A.J.²

24
- 34250930966
- (1930) Z. Phys. , vol.64 , pp. 781
- Druyvesteyn, M.J.¹

25
- 36149029741
- (1992) Plasma Sources Sci. Technol. , vol.1 , pp. 36
- Godyak, V.A.¹ Piejak, R.B.² Alexandrovich, B.M.³

26
- 0030242452
- (1996) J. Appl. Phys. , vol.80 , pp. 2614
- Bukowski, J.D.¹ Graves, D.B.² Vitello, P.³

27
- 0032607024
- (1999) J. Appl. Phys. , vol.86 , pp. 152
- Fiala, A.¹ Kiehlbauch, M.² Mahnovski, S.³ Graves, D.B.⁴

28
- 0033704157
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 213
- Xu, X.P.¹ Rauf, S.² Kushner, M.J.³

29
- 0030503029
- (1996) J. Phys. Chem. Ref. Data , vol.25 , pp. 1341
- Christophorou, L.G.¹ Olthoff, J.K.² Rao, M.V.V.S.³

30
- 0001785372
- (1979) J. Phys. B , vol.12
- Peart, B.¹ Forrest, R.² Dolder, K.T.³

31
- 0033341723
- (1999) Plasma Sources Sci. Technol. , vol.8 , pp. 553
- Kimura, T.¹ Ohe, K.²

32
- 0000208288
- (1995) Plasma Sources Sci. Technol. , vol.4 , pp. 332
- Godyak, V.A.¹ Piejak, R.B.² Alexandrovich, B.M.³

33
- 11744346681
- (1998) Phys. Rev. Lett. , vol.80 , pp. 3264
- Godyak, V.A.¹ Piejak, R.B.² Alexandrovich, B.M.³

34
- 0000085038
- (2000) J. Appl. Phys. , vol.88 , pp. 3748
- Singh, H.¹ Coburn, J.W.² Graves, D.B.³

35
- 0028462183
- (1994) Jpn. J. Appl. Phys., Part 1 , vol.33 , pp. 4157
- Bonham, R.A.¹

36
- 0026971301
- (1992) Plasma Chem. Plasma Process. , vol.12 , pp. 523
- Kiss, L.D.B.¹ Sawin, H.H.²

37
- 0031477558
- (1997) J. Vac. Sci. Technol. A , vol.15 , pp. 3120
- Tserepi, A.¹ Schwarzenbach, W.² Derouard, J.³ Sadeghi, N.⁴

38
- 0031153374
- (1997) Jpn. J. Appl. Phys., Part 2 , vol.36
- Suzuki, C.¹ Sasaki, K.² Kadota, K.³

39
- 0000863063
- (1998) J. Appl. Phys. , vol.84 , pp. 4736
- Capps, N.E.¹ Mackie, N.M.² Fisher, E.R.³

40
- 0033157537
- (1999) Jpn. J. Appl. Phys., Part 1 , vol.38 , pp. 4377
- Arai, T.¹ Goto, M.² Horikoshi, K.³ Mashino, S.⁴ Aikyo, S.⁵

41
- 0027561175
- (1993) Jpn. J. Appl. Phys., Part 2 , vol.32
- Hikosaka, Y.¹ Toyoda, H.² Sugai, H.³

42
- 0001620883
- (1999) J. Appl. Phys. , vol.85 , pp. 3952
- Cunge, G.¹ Booth, J.P.²

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