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Volumn 25, Issue 2, 2007, Pages 246-251

Cryotrapping assisted mass spectrometry for the analysis of complex gas mixtures

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON TRAPS; LIQUID NITROGEN; MASS SPECTROMETRY; PATTERN RECOGNITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; VAPOR PRESSURE;

EID: 34248574151     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2432351     Document Type: Article
Times cited : (19)

References (17)
  • 3
    • 1342326077 scopus 로고    scopus 로고
    • F. L. Tabaŕs, et al., Vacuum 73, 161 (2004).
    • (2004) Vacuum , vol.73 , pp. 161
    • Tabaŕs, F.L.1
  • 7
  • 14
    • 0003450764 scopus 로고    scopus 로고
    • edited by P. J.Linstrom and W. G.Mallard, National Institute of Standards and Technology, Gaithersburg, MD
    • NIST Chemistry WebBook, NIST Standard Reference Database Number 69, edited by, P. J. Linstrom, and, W. G. Mallard, National Institute of Standards and Technology, Gaithersburg, MD (http://webbook.nist.gov).
    • NIST Standard Reference Database Number 69
  • 15
    • 0032692055 scopus 로고    scopus 로고
    • 0925-9635 10.1016/S0925-9635(99)00142-9
    • For a review of deposition techniques for carbon nitride films, see S. Muhl and J. M. Ḿndez, Diamond Relat. Mater. 0925-9635 10.1016/S0925-9635(99)00142-9 8, 1809 (1999) and references therein; also F. L. Tabaŕs and V. Rohde, Plasma Phys. Controlled Fusion 46, B381 (2004).
    • (1999) Diamond Relat. Mater. , vol.8 , pp. 1809
    • Muhl, S.1    Ḿndez, J.M.2
  • 16
    • 12744253362 scopus 로고    scopus 로고
    • For a review of deposition techniques for carbon nitride films, see S. Muhl and J. M. Ḿndez, Diamond Relat. Mater. 0925-9635 10.1016/S0925-9635(99)00142-9 8, 1809 (1999) and references therein; also F. L. Tabaŕs and V. Rohde, Plasma Phys. Controlled Fusion 46, B381 (2004).
    • (2004) Plasma Phys. Controlled Fusion , vol.46 , pp. 381
    • Tabaŕs, F.L.1    Rohde, V.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.